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Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same

A technology of photosensitive resin and composition, which is applied in the field of photosensitive resin composition for manufacturing common electrode substrates and local flatness, to achieve the effect of ensuring response speed and improving local flatness

Active Publication Date: 2011-09-28
SAMSUNG ELECTRONICS CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] like figure 1 As shown, although an organic layer with a mountain-shaped structure can improve the response speed of the liquid crystal, when the organic layer is formed, a concave and convex structure 15 will be formed on the protrusion 10

Method used

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  • Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same
  • Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same
  • Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example 1

[0097] About 10 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile), about 200 parts by weight of propylene glycol monomethyl ether acetate, about 20 parts by weight of glycidyl methacrylate The ester, about 30 parts by weight of isobornyl acrylate represented by the above chemical formula (1), and about 30 parts by weight of styrene were added to a flask having a cooling tube and a mixer to thereby form a mixture solution in the flask. After the mixture was replaced with nitrogen, the mixture was slowly stirred. Then, the mixture was heated to a temperature of about 62° C. and maintained for about 5 hours, thereby obtaining an acryl-based copolymer solution. The acryl-based copolymer solution includes about 45% solids by weight, based on the total weight of the acryl-based copolymer solution. The acryl-based copolymer in the acryl-based copolymer solution had a weight average molecular weight of about 12,000 based on polystyrene standards. The weight average molecular...

Synthetic example 2

[0100] By adding about 1 mole of 4,4'-[1-[4-[1-[4-hydroxyphenyl]-1-methylethyl]phenyl]ethylene]bisphenol and about 2 moles of 1, 4,4'-[1-[4-[1-[4-hydroxyphenyl]-1-methylethane) produced by condensation reaction between 2-quinonediazo-5-sulfonate [chloride] Base] phenyl] methylene] bisphenol 1,2-naphthoquinonediazo-5-sulfonate.

[0101] Preparation of Photosensitive Resin Composition Solution

example 1

[0103] About 100 parts by weight of the acryloyl-based copolymer solution according to Synthesis Example 1 and about 25 parts by weight of 4,4'-[1-[4-[1-[4-hydroxyphenyl] according to Synthesis Example 2 -1-methylethyl]phenyl]methylene]bisphenol 1,2-naphthoquinonediazo-5-sulfonate were mixed to form a mixture. The mixture was dissolved in diethylene glycol dimethyl ether to form a mixture solution including about 35% by weight solid content based on the total weight of the mixture solution. The mixture solution was filtered using a microporous filter having pores with a size of about 0.2 μm to obtain a photosensitive resin composition solution.

[0104] Form organic layer pattern

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PUM

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Abstract

A photosensitive resin composition for an organic layer pattern includes about 100 parts by weight of an acryl-based copolymer and about 5 to about 100 parts by weight of a 1,2-quinonediazide compound. The acryl-based copolymer is prepared by copolymerizing about 5 to about 60 percent by weight of an isobonyl carboxylate-based compound based on a total weight of the acryl-based copolymer, about 10 to about 30 percent by weight of an unsaturated compound carrying an epoxy group, about 20 to about 40 percent by weight of an olefin-based unsaturated compound, and about 10 to about 40 percent by weight of one selected from unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, and a mixture thereof. Methods of manufacturing a TFT substrate and a common electrode substrate using the photosensitive resin composition are also provided. Advantageously, the organic layer pattern may have a mountain structure having an improved local flatness without concave and convex structures.

Description

technical field [0001] The present invention relates to a photosensitive resin (photosensitive resin, photosensitive resin) composition, a method for manufacturing a thin film transistor substrate using the photosensitive resin, and a method for manufacturing a common electrode substrate (common electrode substrate). More particularly, the present invention relates to a photosensitive resin composition for improving local flatness of an organic layer, a method of manufacturing a thin film transistor substrate using the photosensitive resin, and a method of manufacturing a common electrode substrate. Background technique [0002] Among methods of forming an alignment layer (alignment layer) for aligning liquid crystals in a liquid crystal display device, various methods are roughly classified into such as twisted nematic (TN) mode ( Twisted Nematic mode) or horizontal alignment method (horizontal alignment method) such as in-plane switching (IPS) mode (In-plane Switching mode...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/027G03F7/004G03F7/20G03F7/027
CPCG02F1/136227G03F7/022G03F7/027H01L27/1248
Inventor 李羲国李东基金载星金柄郁尹赫敏丘冀赫尹柱豹崔相角
Owner SAMSUNG ELECTRONICS CO LTD