Method for making reverse ladder structure by using architecture-complementary micro-patterning technique

A micro-patterning, inverted trapezoidal technology, applied in microlithography exposure equipment, photolithographic process exposure devices, semiconductor/solid-state device manufacturing, etc. For the peeling process and other problems, it can achieve the effect of simple processing technology, reduced pollution and wide application range.

Inactive Publication Date: 2006-12-13
CHANGZHOU INST OF ENERGY STORAGE MATERIALS &DEVICES
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the disadvantages of complex and expensive lithography equipment, the need to control the ambient temperature and cleanliness, and complex processing steps in the lithography process, the inverted trapezoidal structure of epoxy resin produced by the capillary micromolding described above

Method used

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  • Method for making reverse ladder structure by using architecture-complementary micro-patterning technique
  • Method for making reverse ladder structure by using architecture-complementary micro-patterning technique

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] 1) Select a polydimethylsiloxane soft template 2 with a positive trapezoidal surface cross-section, place the polydimethylsiloxane soft template 2 on the glass substrate 1, and place the polydimethylsiloxane soft template 2 on the glass substrate 1. A capillary channel 3 is formed between the template 2 and the glass substrate 1 . Add an aqueous solution of polyvinylpyrrolidone with a concentration of 10% by weight to the capillary channel 3, and after the aqueous solution of polyvinylpyrrolidone flows into the capillary channel 3 under the action of capillary force, soften the polydimethylsiloxane The template 2 and the glass substrate 1 were placed together in a drying oven at 30 degrees Celsius to dry the polyvinylpyrrolidone aqueous solution.

[0022] 2), peel off the polydimethylsiloxane soft template 2 from the dried glass substrate 1, coat a photoresist film 5 on the glass substrate 1 with polyvinylpyrrolidone 4 patterns, and then apply the photoresist film 5 dr...

Embodiment 2

[0025] 1), select the polydimethylsiloxane soft template 2 whose surface pattern cross-section is a regular trapezoidal structure, and place the polydimethylsiloxane soft template 2 on the glass substrate with indium tin oxide deposited on the surface (hereinafter referred to as On the "ITO glass substrate") 1 , a capillary channel 3 is formed between the polydimethylsiloxane soft template 2 and the ITO glass substrate 1 . Add an aqueous solution of polyvinylpyrrolidone with a concentration of 20% by weight to the capillary channel 3, and after the aqueous solution of polyvinylpyrrolidone flows into the capillary channel 3 under the action of capillary force, soften the polydimethylsiloxane The template 2 and the ITO glass substrate 1 were placed together in a drying oven at 50 degrees Celsius to dry the polyvinylpyrrolidone aqueous solution.

[0026] 2), the polydimethylsiloxane soft template 2 is peeled off from the dried ITO glass substrate 1, and a photoresist film 5 is co...

Embodiment 3

[0029] 1) Select the polydimethylsiloxane soft template 2 whose surface pattern cross-section is a regular trapezoidal structure, place the polydimethylsiloxane soft template 2 on the glass substrate 1, and the polydimethylsiloxane soft template 2 and the glass substrate 1 form a capillary channel 3 . Add an aqueous solution of polyvinylpyrrolidone with a concentration of 30% by weight to the end of the capillary channel 3, and after the aqueous solution of polyvinylpyrrolidone flows into the capillary channel 3 under the action of capillary force, soften the polydimethylsiloxane The template 2 and the glass substrate 1 were placed together in a drying oven at 80 degrees Celsius to dry the polyvinylpyrrolidone aqueous solution.

[0030] 2) Peel off the polydimethylsiloxane soft template 2 from the dried glass substrate 1, apply a photoresist film 5 on the glass substrate 1 with polyvinylpyrrolidone 4 patterns, and then apply the photoresist film 5 drying.

[0031] 3) Place t...

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Abstract

The invention relates to a method for processing complementary structure into pattern. The method comprises steps of: employing a capillary micro mould to make a micro structure with positive ladder type cross-section on the surface of the base, and taking the micro structure as a mount and coating a layer of membrane on the surface; selecting a solution that can solve the capillary micro mould, but can not solve its surface membrane to solve the micro structure, and driving the membrane fall away to keep the micro structure with negative ladder type on the base surface.

Description

technical field [0001] The invention belongs to a micro-patterning processing method, in particular to a method for producing an inverted trapezoidal structure by micro-patterning a complementary structure used for the production of an organic light-emitting layer and an electrode separator for an organic electroluminescent matrix display. Background technique [0002] Organic light-emitting display has become one of the most popular flat-panel display technologies due to its characteristics of flexibility, light weight, low energy consumption, and wide viewing angle. When applying organic electroluminescent diodes to flat panel displays, it is necessary to arrange the diodes in a matrix form. Diodes arranged in a matrix are generally specified by the method of vertical crossing of row electrodes and column electrodes. On the substrate with patterned row electrodes, in order to realize the separation of the column electrodes and to protect the performance of the organic sem...

Claims

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Application Information

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IPC IPC(8): G03F7/20H05B33/00H01L21/00
Inventor 韩艳春邢汝博于新红
Owner CHANGZHOU INST OF ENERGY STORAGE MATERIALS &DEVICES
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