A
plasma source device (100) for providing a gas volume (1) in a
plasma accelerator device (200) comprises a
capillary channel device (10) for conducting a gas flow (2), the
capillary channel device having an
irradiation port (10A) for receiving a
laser light (3) in an
irradiation direction deviating from an axial flow direction of the gas flow (2), and an output port (10B) aligned with the
irradiation port (10A) and arranged for outputting a
plasma accelerator output (4) comprising an
electron beam and / or an X-
ray beam, where the gas volume (1) is provided by a gas flowing through a gas flow (2) of an irradiation path (5) between the irradiation port (10A) and the output port (10B). The
capillary channel arrangement (10) comprises a plurality of capillary channels (11, 12), where each capillary channel (11, 12) has two radial apertures (13), the capillary channels (11, 12) are arranged side by side, all apertures (13) are aligned in series to provide an irradiation path (5) through the capillary channel arrangement (10) in an irradiation direction (z), where a first aperture (13) of a first capillary channel (11) is an irradiation port (10A) and a second aperture (12) of a second capillary channel (12) is an irradiation port (10B). The last aperture (13) of the last capillary channel (12) is an output port (10B), and the gas volume (1) comprises a plurality of gas sections (14, 15) arranged along the irradiation path (5) wherein each gas section (14, 15) is provided by one of the capillary channels (11, 12) with a predetermined gas parameter, and the gas sections (14, 15) provide a continuous gas field as a gas volume (1) along the irradiation path (5). Furthermore, a plasma accelerator device (200) and a method of generating an
electron beam and / or an X-
ray beam are described.