LED with the current transfer penetration-enhanced window layer structure

A technology of light-emitting diodes and window layers, applied in circuits, electrical components, semiconductor devices, etc., can solve the problems of large current density under electrodes, large difference in refractive index, affecting device performance, etc., to reduce growth time and current consumption. , the effect of high light efficiency

Inactive Publication Date: 2007-07-11
BEIJING TIMESLED TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] 1. The absorbing substrate (such as GaAs, Si, etc.) has a strong absorption of the light generated by the luminescent material (such as AlGaInP, GaN, ZnO, etc.), so that the light emitted to the direction of the substrate is almost completely absorbed, and finally in the form of heat issued, seriously affecting the further improvement of device performance;
[0004] 2. The refractive index of the window layer material is quite different from that of air. Only a small part (about 5%) of the light emitted to the upper surface of the device can be emitted out of the body, and most of the rest of the light is reflected back to be The substrate absorbs, and the light extraction efficiency is very low;
With regard to solving the problem of high current density under the electrode, someone abroad has proposed a method of making a current blocking layer between the upper confinement layer and the current spreading layer, as shown in Figure 5, this method effectively blocks the current from the electrode directly to the Lower transport, increased current expansion, and improved luminous efficiency, but the processes they use are almost all secondary epitaxy methods, which are high in cost and expensive in equipment
Although the four methods mentioned above can solve the current problems of light-emitting diodes from a certain aspect, they cannot solve the three existing problems at the same time.

Method used

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  • LED with the current transfer penetration-enhanced window layer structure
  • LED with the current transfer penetration-enhanced window layer structure
  • LED with the current transfer penetration-enhanced window layer structure

Examples

Experimental program
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Effect test

Embodiment 1

[0046] As shown in Figure 6, take AlGaInP LED as an example. The device consists of the following parts: p-type electrode 100, p-type current spreading layer 200, p-type upper confinement layer 300, active region 400, n-type lower confinement layer 500, n-type buffer layer 600, N-type substrate 700, n-type lower electrode 800, and p-type current transport anti-reflection window layer 140 composed of p-type conductive light-transmitting layer 130, current blocking layer 120 and p-type current spreading layer 200 ; Its preparation process and method are as follows:

[0047] 1. On an n-type substrate 700 formed of GaAs and other materials that can match AlGaInP, use MOVCD method to epitaxially grow n-type buffer layer 600, n-type lower confinement layer 500, active region 400, p-type An upper confinement layer 300, a p-type current spreading layer 200, thus obtaining an epitaxial wafer of an AlGaInP light-emitting diode;

[0048] 2. The specific process steps are: firstly, the ...

Embodiment 2

[0052] As shown in Figure 7, take AlGaInP LED as an example. The device consists of the following parts: p-type electrode 100, p-type current spreading layer 200, p-type upper confinement layer 300, active region 400, n-type lower confinement layer 500, n-type buffer layer 600, n-type substrate 700, n-type lower electrode 800, n-type DBR reflective layer 900, and p-type conductive light-transmitting layer 130, current blocking layer 120 and p-type current spreading layer 200 composed of p-type The current transport anti-reflection window layer 140; its preparation process and method are as follows:

[0053] 1. On the n-type substrate 700 formed by GaAs and other materials that can match AlGaInP, the n-type buffer layer 600, the n-type DBR light-reflecting layer 900, and the n-type lower confinement layer 500 are sequentially grown by MOVCD method, The active region 400, the p-type upper confinement layer 300, and the p-type current spreading layer 200, thus obtaining the epit...

Embodiment 3

[0058] As shown in Figure 8, take AlGaInP LED as an example. The device consists of the following parts: p-type electrode 100, p-type current spreading layer 200, p-type upper confinement layer 300, active region 400, n-type lower confinement layer 500, n-type buffer layer 600, n-type substrate 700, n-type electrode 800, n-type DBR reflective layer 900, and the p-type current formed by p-type conductive light-transmitting layer 130, current blocking layer 120 and p-type current spreading layer 200 Transport window layer 140; its preparation process and method are as follows:

[0059] 1. On an n-type substrate 700 formed of GaAs and other materials that can match AlGaInP, use MOVCD method to epitaxially grow n-type buffer layer 600, n-type lower confinement layer 500, active region 400, p-type An upper confinement layer 300, a p-type current spreading layer 200, thus obtaining an epitaxial wafer of an AlGaInP light-emitting diode;

[0060] 2. The method of post-processing: fi...

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Abstract

This invention relates to one light diode of current streghening window layer structure in semiconductor photo electricity technique, which comprises top electrode, current extensive layer, top limit layer, source area, down limit layer, buffer layer, underlay, down electrode, DBR reflection layer, wherein, the top electrode ad current extensive layer are set with conductive transparent layer; the current block layer is set on or down extensive layer to form current transporting window layer by transparent layer, current extensive layer and current block layer.

Description

technical field [0001] The invention relates to a current transport antireflection window layer structure introduced in a light emitting diode (LED), relates to a novel LED device structure, and belongs to the technical field of semiconductor optoelectronics. Background technique [0002] At present, the design method and existing problems of ordinary front-mounted light-emitting diodes: metal-organic chemical vapor deposition (MOCVD) is generally used for epitaxial growth. The device structure is shown in Figure 1, including vertical stacking growth from top to bottom. The upper electrode 10, the current spreading layer 20, the upper confinement layer 30, the active region 400, the lower confinement layer 50, the buffer layer 60, the substrate 70, and the lower electrode 80. By injecting current, electron-hole pairs radiate and recombine in the active region to emit light, and the resulting photons are emitted from the front of the device. The three main problems with this...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L33/00H01L33/14
CPCH01L33/145
Inventor 沈光地陈依新韩金茹
Owner BEIJING TIMESLED TECH CO LTD
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