Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Component having an interior surface coated with a thin film inert corrosion resistant barrier

a technology of inert layer and coating, applied in the field of chemical deposition, can solve the problems of limiting the life high corrosive gases used in microelectronic fabrication such as thin film deposition and etching, and reducing the corrosion rate of components and equipment, so as to enhance the corrosion protection of the metal surface and reduce the corrosion rate

Inactive Publication Date: 2005-06-16
ELSAYED ALI HANI E +1
View PDF7 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The method effectively extends the life of components by providing a contaminant-free, corrosion-resistant coating that can be applied at temperatures between 400°C to 600°C, enhancing protection without requiring complex vacuum systems or hazardous materials.

Problems solved by technology

Many of the gases used in manufacturing tend to corrode metal parts of components and equipment.
For example, gases used in microelectronic fabrication such as in thin film deposition and etching are highly corrosive gases.
The corrosive properties of these gases limit the life of the components and equipment, such as for example, gas flow control regulators, used to control the gases.
The reaction products that are created when the gases interact with the surface of the gas flow control component may introduce contaminants into the gas stream.
The continuous flow of these corrosive gases through a gas flow control component greatly reduces the life of the component.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Component having an interior surface coated with a thin film inert corrosion resistant barrier
  • Component having an interior surface coated with a thin film inert corrosion resistant barrier
  • Component having an interior surface coated with a thin film inert corrosion resistant barrier

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0008] The inventive methods increase the corrosion resistance of components having interior surfaces by coating the inside surface of the component with SiO2 (silicon dioxide or silica). In particular, low temperature chemical vapor deposition of SiO2 from the thermal decomposition of commercially available, low toxicity reagents produces silicon films that have good uniformity and film properties.

[0009] DADBS is a preferred precursor of SiO2, as it is relatively safe and easy to handle, and it is liquid at ambient conditions. The basic reactions used to create a layer of SiO2 from a precursor are described below. These basic processes are similar to the processes used in semiconductor manufacturing, and the resulting coating on the inside surface of the treated components is contaminant-free to a level compatible to the semiconductor industry. The inventive methods are particularly adapted for, but not limited to, treating gas flow control components such as regulators, valves an...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
temperatureaaaaaaaaaa
temperatureaaaaaaaaaa
temperatureaaaaaaaaaa
Login to View More

Abstract

The present invention reduces corrosion rates on metal surfaces, such as the interior surfaces of gas flow control components by depositing a chemically inert layer on the metal surface of the component and other associated parts of the component that are exposed to corrosive gases. The disclosed method provides for depositing a relatively chemically inert thin film such as silicon dioxide along the gas exposed surface areas of the metal surface thereby enhancing corrosion protection to the metal surfaces. The present invention can be used to deposit a chemically inert thin film at locations inside components that are outside a direct line of sight and at locations normally unreachable by a gas flowing through the components. The present invention does not require a vacuum system for the deposition of the corrosion-resistant thin film.

Description

RELATED APPLICATIONS [0001] A provisional application corresponding to the subject matter of this application was filed on Oct. 18, 2002, and assigned Ser. No. 60 / 419,146. Applicants claim the benefit of the filing date of said provisional application.FIELD OF THE INVENTION [0002] The invention relates to chemical deposition and more particularly to the chemical deposition of an inert layer on the metal parts of components and associated adapted to be exposed to corrosive gases when in use. BACKGROUND OF THE INVENTION [0003] Many of the gases used in manufacturing tend to corrode metal parts of components and equipment. For example, gases used in microelectronic fabrication such as in thin film deposition and etching are highly corrosive gases. For example, chlorine (Cl2), hydrochloric acid (HCl) and fluorine (F2) are used in plasma etching, and dichlorosilane (SiH2Cl2), germane (GeH4), and silicon tetrachloride (SiCl4) are used in plasma deposition. The corrosive properties of thes...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(United States)
IPC IPC(8): C23C16/40C23C16/44
CPCC23C16/4402C23C16/402
Inventor ELSAYED-ALI, HANI E.WALDBUSSER, EDWIN
Owner ELSAYED ALI HANI E
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com