Wafer probe station having a skirting component

Abstract

A probe station includes a fully guarded chuck assembly and connector mechanism for increasing sensitivity to low-level currents while reducing settling times. The chuck assembly includes a wafer-supporting first chuck element surrounded by a second chuck element having a lower component, skirting component and upper component each with a surface portion extending opposite the first element for guarding thereof. The connector mechanism is so connected to the second chuck element as to enable, during low-level current measurements, the potential on each component to follow that on the first chuck element as measured relative to an outer shielding enclosure surrounding each element. Leakage current from the first chuck element is thus reduced to virtually zero, hence enabling increased current sensitivity, and the reduced capacitance thus provided by the second chuck element decreases charging periods, hence reducing settling times. With similar operation and effect, where any signal line element of the connector mechanism is arranged exterior of its corresponding guard line element, such as adjacent the chuck assembly or on the probe-holding assembly, a guard enclosure is provided to surround and fully guard such signal line element in interposed relationship between that element and the outer shielding enclosure.

Description

[0001] This is a continuation of U.S. patent application Ser. No. 08 / 100,494 filed on Aug. 2, 1993, which, in turn, is a continuation-in-part of U.S. patent application Ser. No. 07 / 896,853 filed on Jun. 11, 1992, now U.S. Pat. No. 5,345,170.BACKGROUND OF THE INVENTION [0002] The present invention is directed to probe stations adapted for making highly accurate low-current and low-voltage measurements of wafers and other electronic test devices. More particularly, the invention relates to such a probe station having a guarding system for preventing current leakage, a Kelvin connection system to eliminate voltage losses caused by line resistances, and an electromagnetic interference (EMI) shielding system. [0003] The technique of guarding to minimize current leakage during low-current measurements, the use of Kelvin connections for low-voltage measurements, and the provision of EMI shielding are all well known and discussed extensively in the technical literature. See, for example, an...

AI Technical Summary

Benefits of technology

"The present invention provides a probe station with integrated and ready-to-use guarding, Kelvin connection, and shielding systems for individually movable probes and the chuck assembly. The chuck assembly includes at least three chuck assembly elements electrically insulated from one another, and a connector assembly with detachable electrical connector elements for easy connection of a guarded cable. The chuck assembly elements are positioned at progressively greater distances from the probe, and a nonzero potential is established on the second chuck assembly element to reduce leakage currents and improve sensitivity for low-level currents. The invention also provides an improved guarding system for accurate and rapid measurement of very low-level currents. The foregoing and other objectives, features, and advantages of the invention will be more readily understood upon consideration of the following detailed description of the invention."

Problems solved by technology

However the custom set-up of such probe stations required for guarding and Kelvin connection procedures is time-consuming and, in some instances, limited as to effectiveness.

Accordingly significant time-consuming alteration of such a station would be required to obtain both a guarded and shielded chuck assembly.

The probes on the probe card, on the other hand, are both guarded and shielded; however there is no means of enabling each probe to be moved independently of the others in unison with its guard and shield to accommodate different contact patterns of test devices, thus sacrificing flexibility of the probe station.

However such wiring requires time-consuming set-up, particularly if Kelvin connections are also required.

Moreover, the use of sheet insulation to insulate the copper guarding layer from the add-on surface and the underlying chuck assembly fails to provide as low a dielectric constant between the respective elements as is desirable to minimize leakage currents in view of the low level of current to be measured.

With respect to probe stations that are designed to accommodate the measurement of low levels of current, a sensitivity threshold is normally encountered below which further improvements in current sensitivity are difficult to reliably achieve.

A particular difficulty encountered in low-level current measurements is the excessive time required for measurement voltages to stabilize with reference to the device under test after a shift in voltage has occurred at the electrical input to the probe station.

This problem of excessive settling time, as it is referred to, increases as the level of current under measurement is reduced.

That is, due to the residual capacitance existing between spaced apart conductors in the region surrounding the immediate test site, a certain amount of time is required for the conductors that are in direct connection with the test device to fully charge or discharge to their desired voltages, and the time required will increase as the current through the device decreases.

In addition to settling effects, measurements of low level currents are also susceptible to error due to electrical discharge effects which occur because of the acceptance and release of charge by nonconductors in the region surrounding the immediate test site.

At very low currents, these discharge effects can significantly distort measurement values and hence contribute to unacceptable levels of measurement instability.

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