Starved source diffusion for avalanche photodiode

a photodiode and starved source technology, applied in the field of optical communication, can solve the problem of reducing the responsivity of the edge, and achieve the effect of reducing the edge gain, and improving the reliability of the method

Inactive Publication Date: 2006-04-20
II VI DELAWARE INC
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  • Abstract
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  • Claims
  • Application Information

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Benefits of technology

[0016] The present invention offers an improvement over the prior art by providing a simpler, more reliable method for controlling the edge effect in avalanche photodiodes (APDs). According to the invention, the edge effect is controlled by reducing edge gain near the edges of the active region. This is accomplished by creating a sloped diffusion front near the edges of the active region such that the distance between a diffusion region and the absorber layer below it is increased. This reduces the responsivity of the edge.

Problems solved by technology

This reduces the responsivity of the edge.

Method used

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  • Starved source diffusion for avalanche photodiode
  • Starved source diffusion for avalanche photodiode

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Embodiment Construction

[0031] The present invention relates to starved source diffusion methods for controlling the edge effect in avalanche photodiodes (APDs). As noted in the Background Section above, edge effect is a phenomenon where the edges of a diffusion region in the active region of an APD have a higher responsivity, or ratio of current output to light input, than the center of the APD. As a result, a user or automated process aligning an APD to an optical fiber often misaligns the APD, mistaking the edge of the APD for the center.

[0032] According to the invention, the edge effect is controlled by reducing edge gain near the edges of the active region. This is accomplished by creating a sloped diffusion front near the edges of the active region such that the distance between a diffusion region and the charge layer below it is increased. In other words, a thicker avalanche layer is created, increasing the edge gain and reducing the responsivity of the edge.

[0033] The sloped diffusion front is ad...

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Abstract

Starved source diffusion methods for forming avalanche photodiodes (APDs) are provided for controlling the edge effect. The edge effect is controlled by reducing edge gain near the edges of an APD active region. This is accomplished by creating a sloped diffusion front near the edges of the active region. The sloped diffusion front is advantageously formed in a single doping step by using a patterned mask during doping. The patterned mask reduces the depth to which dopants diffuse in areas where it only partly covers the underlying layer. By covering more of the underlying layer nearer the edge and progressively less towards the center, the sloped diffusion front is formed. The shallower diffusion depth near the edge reduces the edge gain, and therefore the edge effect. As a result, an APD to fiber misalignment is less likely, and possibility of edge breakdown is greatly reduced.

Description

BACKGROUND OF THE INVENTION [0001] 1. The Field of the Invention [0002] The present invention relates to the field of optical communications. More particularly, the present invention relates to the field of avalanche photodiodes. [0003] 2. The Relevant Technology [0004] Computer and data communications networks continue to develop and expand due to declining costs, improved performance of computer and networking equipment, the remarkable growth of the internet, and the resulting increased demand for communication bandwidth. Such increased demand occurs within and between metropolitan areas as well as within communications networks. Moreover, as organizations have recognized the economic benefits of using communications networks, network applications such as electronic mail, voice and data transfer, host access, and shared and distributed databases are increasingly used as a means to increase user productivity. This increased demand, together with the growing number of distributed co...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): H01L31/109
CPCH01L31/03529H01L31/107H01L31/18Y02E10/50
Inventor FRANCIS, DANIEL A.NABIEV, RASHITRATOWSKY, RICHARD P.YOUNG, DAVID BRUCETHOMAS, SUNILDIMITROV, ROMAN
Owner II VI DELAWARE INC
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