Exposure apparatus, exposure method, and method for producing device

a technology of exposure apparatus and exposure method, which is applied in the direction of photomechanical apparatus, printing, instruments, etc., can solve the problems of insufficient margin, inconvenience, and difficulty in matching the substrate surface with respect to the image plane of the projection optical system
US20060098178A1Inactive Publication Date: 2006-05-11NIKON CORP
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Patent Information

Authority / Receiving Office
US · United States
Patent Type
Applications(United States)
Current Assignee / Owner
NIKON CORP
Publication Date
2006-05-11
Estimated Expiration
Not applicable · inactive patent

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Abstract

A liquid immersion photolithography system has an exposure system that exposes an exposure area on a substrate with electromagnetic radiation and includes a projection optical system. In addition, a liquid flow is provided between the projection optical system and the exposure area. Further, a member at one side of the projection optical system provides the liquid flow having a desired velocity profile when the liquid flow is present in the exposure area.
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Description

CROSS-REFERENCE

[0001] This is a Division of application Ser. No. 11 / 147,373 filed Jun. 8, 2005, which in turn is a Continuation of International Application No. PCT / JP03 / 015735 filed on Dec. 9, 2003 and that claims the conventional priority of Japanese patent Application No. 2002-357931 filed on Dec. 10, 2002. The disclosures of these applications are incorporated herein by reference in their entireties.BACKGROUND OF THE INVENTION

[0002] 1. Field of the Invention

[0003] The present invention relates to an exposure apparatus and an exposure method for performing the exposure with an image of a pattern projected by a projection optical system in a state in which at least a part of a space between the projection optical system and a substrate is filled with a liquid. The present invention also relates to a method for producing a device.

[0004] 2. Description of the Related Art

[0005] Semiconductor devices and liquid crystal display devices are produced by the so-called photolithograph...

Claims

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