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Exposure apparatus, exposure method, and method for producing device

a technology of exposure apparatus and exposure method, which is applied in the direction of photomechanical apparatus, printing, instruments, etc., can solve the problems of insufficient margin, inconvenience, and difficulty in matching the substrate surface with respect to the image plane of the projection optical system

Inactive Publication Date: 2006-05-11
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The present invention provides an exposure apparatus that can accurately transfer a pattern onto a substrate by arranging a liquid in a desired state between a projection optical system and the substrate. This is achieved by surface-treating the portion of the projection optical system that comes into contact with the liquid to adjust its affinity for the liquid. The apparatus can maintain the liquid in a stable state even during full field exposure or scanning type exposure, and can suppress any inconvenience caused by turbulence in the liquid. The technical effects of the invention include improved accuracy and stability of pattern transfer, and improved efficiency and reliability of the exposure process.

Problems solved by technology

If the depth of focus δ is too narrowed, it is difficult to match the substrate surface with respect to the image plane of the projection optical system.
It is feared that the margin is insufficient during the exposure operation.
An inconvenience arises such that the pattern image, which is to be transferred to the substrate, is deteriorated.
In other cases, the pattern image is deteriorated as well when any turbulence appears in the liquid flow when the exposure is performed while making the liquid to flow through the space between the projection optical system and the substrate.

Method used

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  • Exposure apparatus, exposure method, and method for producing device
  • Exposure apparatus, exposure method, and method for producing device

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second embodiment

[0092] Next, an explanation will be made with reference to FIG. 7 about the present invention.

[0093] An exposure apparatus EX of this embodiment is designed such that the following conditional expression is satisfied provided that d represents a thickness of the liquid 50 between the lower surface 7A of the projection optical system PL and the surface of the substrate P (in this case, the spacing distance between the projection optical system PL and the substrate P), v represents a velocity of a flow of the liquid 50 between the projection optical system PL and the substrate P, ρ represents a density of the liquid 50, and μ represents a coefficient of viscosity of the liquid 50:

(v·d·ρ) / μ≦2,000  (3)

Accordingly, the liquid 50 flows as a laminar flow in the space 56. As for the liquid 50, it is also assumed that a plurality of different flow velocities v exist depending on the position in the liquid. However, it is enough that the maximum velocity Vmax thereof satisfies the expressi...

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Abstract

A liquid immersion photolithography system has an exposure system that exposes an exposure area on a substrate with electromagnetic radiation and includes a projection optical system. In addition, a liquid flow is provided between the projection optical system and the exposure area. Further, a member at one side of the projection optical system provides the liquid flow having a desired velocity profile when the liquid flow is present in the exposure area.

Description

CROSS-REFERENCE [0001] This is a Division of application Ser. No. 11 / 147,373 filed Jun. 8, 2005, which in turn is a Continuation of International Application No. PCT / JP03 / 015735 filed on Dec. 9, 2003 and that claims the conventional priority of Japanese patent Application No. 2002-357931 filed on Dec. 10, 2002. The disclosures of these applications are incorporated herein by reference in their entireties.BACKGROUND OF THE INVENTION [0002] 1. Field of the Invention [0003] The present invention relates to an exposure apparatus and an exposure method for performing the exposure with an image of a pattern projected by a projection optical system in a state in which at least a part of a space between the projection optical system and a substrate is filled with a liquid. The present invention also relates to a method for producing a device. [0004] 2. Description of the Related Art [0005] Semiconductor devices and liquid crystal display devices are produced by the so-called photolithograph...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): G03B27/42G03F7/20
CPCG03F7/2041G03F7/709G03F7/70341H01L21/0274
Inventor NAGASAKA, HIROYUKIMAGOME, NOBUTAKA
Owner NIKON CORP
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