Apparatus for and method of processing substrate subjected to exposure process

a technology of substrate and exposure process, applied in the direction of photomechanical apparatus, instruments, printing, etc., can solve the problems of line width variation and no particular consideration of controlling this time interval, and achieve the effect of improving the uniformity of line width of a pattern
US20070058147A1Inactive Publication Date: 2007-03-15SOKUDO CO LTD
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Patent Information

Authority / Receiving Office
US · United States
Patent Type
Applications(United States)
Current Assignee / Owner
SOKUDO CO LTD
Publication Date
2007-03-15
Estimated Expiration
Not applicable · inactive patent

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Abstract

A substrate subjected to an exposure process by an exposure unit is transported into a cleaning processing unit in a substrate processing apparatus. An adjustment is made to the presence time (more specifically, the waiting time or the cleaning time) of the exposed substrate in the cleaning processing unit to adjust the instant of the end of a cleaning process so as to provide a constant time interval between the instant of the completion of the exposure process and the instant of the end of the cleaning process. Such adjustments provide a constant time interval between the instant of the completion of the exposure process and the instant of the start of a post-exposure bake process, and also provide a constant time interval between the, instant of the completion of the cleaning process and the instant of the start of the post-exposure bake process. This achieves further improvements in the line width uniformity of a pattern formed when a chemically amplified resist is used.
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Description

BACKGROUND OF THE INVENTION

[0001] 1. Field of the Invention

[0002] The present invention relates to a method of processing a substrate such as a semiconductor substrate subjected to an exposure process, a glass substrate for a liquid crystal display device, a glass substrate for a photomask, a substrate for an optical disk and the like, and a substrate processing apparatus for executing the method.

[0003] 2. Description of the Background Art

[0004] As is well known, semiconductor and liquid crystal display products and the like are fabricated by performing a series of processes including cleaning, resist coating, exposure, development, etching, interlayer insulation film formation, heat treatment, dicing and the like on the above-mentioned substrate. An apparatus which performs a resist coating process on a substrate to transfer the substrate to an exposure unit and which receives an exposed substrate from the exposure unit to perform a development process on the exposed substrate,...

Claims

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