Gas discharge laser light source beam delivery unit

Abstract

A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery path from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable beam redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path. The BDU may also include a beam attenuator unit contained within the enclosure adjustably mounted within the enclosure for positioning within the beam delivery path. The BDU may have at least two enclosure isolation mechanisms comprising a first enclosure isolation mechanism on a first side of the enclosure from the at least one optic module and a second enclosure isolation mechanism on a second side of the enclosure from the at least one optic module, each respective enclosure isolation mechanism comprising a flapper valve having a metal to metal seating mechanism and a locking pin assembly. A precision offset ratchet driver operative to manipulate actuator mechanisms in difficult to reach locations may be provided. An external kinematic alignment tool may be provided. A method of contamination control for a BDU is disclosed comprising selection of allowable materials and fabrication processes.

Description

RELATED APPLICATIONS

[0001] The present application is a continuation of U.S. application Ser. No. 10 / 739,961, filed on Dec. 17, 2003, which is a continuation-in-part of United States Published Patent Application No. US / 20020191654A1, entitled LASER LITHOGRAPHY LIGHT SOURCE WITH BEAM DELIVERY, with inventors Klene, et al., published on Dec. 19, 2002, based upon a U.S. application Ser. No. 10 / 141,216, filed on May 7, 2002; and United States Published Patent Application No. US / 20030043876A1, entitled LITHOGRAPHY LASER WITH BEAM DELIVERY AND BEAM POINTING CONTROL, with inventors Lublin et al., published on Mar. 6, 2003, based upon a U.S. Application Ser. No. 10 / 233,253 filed on Aug. 30, 2002; and United States Patent Published Application No. US / 20030091087A1, entitled LITHOGRAPHY LASER SYSTEM WITH IN-PLACE ALIGNMENT TOOL, with inventors Ershov et al., published on May 15, 2003, based upon a U.S. application Ser. No. 10 / 255,806, filed on Sep. 25, 2002; and U.S. application Ser. No. 10 / ...

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