Uv-curable adhesive silicone composition, uv-curable adhesive silicone composition sheet, optical semiconductor apparatus and method for manufacturing the same
a technology of adhesive silicone and composition, which is applied in the direction of photomechanical apparatus, semiconductor/solid-state device details, instruments, etc., can solve the problems of affecting the processing efficiency of the composition, the deformation of the shape, and the inability to obtain the target shape of the cured material, etc., to achieve the effect of convenient handling
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synthesis example 1
—Vinyl Group-Containing Organopolysiloxane Resin (A1)—
[0124]After dissolving 27 mol of organosilane represented as PhSiCl3, 1 mol of ClMe2SiO(Me2SiO)33SiMe2Cl and 6 mol of Me2ViSiCl in a toluene solvent, a toluene solution was dropped in water and cohydrolyzed, further after cleaning with water, and neutralizing and dewatering by alkali cleaning, by stripping the solvent, a vinyl group-containing resin (A1) was synthesized.
[0125]In the resin, a constituent ratio of siloxane units which constitute the resin and a structure represented by [-SiMe2O-(Me2SiO)33—SiMe2O2 / 2] is denoted by a formula: [PhSiO3 / 2]0.27[—SiMe2O-(Me2SiO)33—SiMe2O2 / 2]0.01[Me2ViSiO1 / 2]0.06. The weight average molecular weight of the resin was 65,000, and the melting point thereof was 58° C.
synthesis example 2
—Hydrosilyl Group-Containing Organopolysiloxane Resin (B1)—
[0126]After dissolving 27 mol of organosilane represented as PhSiCl3, 1 mol of ClMe2SiO(Me2SiO)33SiMe2Cl, and 6 mol of Me2HSiCl in a toluene solvent, a toluene solution was dropped in water and cohydrolyzed, further after cleaning with water, and neutralizing and dewatering by alkali cleaning, by stripping the solvent, a hydrosilyl group-containing resin (B1) was synthesized.
[0127]In the resin, a constituent ratio of siloxane units which constitute the resin and a structure represented by [—SiMe2O-(Me2SiO)33—SiMe2O2 / 2] is denoted by a formula: [PhSiO3 / 2]0.27[—SiMe2O-(Me2SiO)33—SiMe2O2 / 2]0.01[Me2HSiO1 / 2]0.06. The weight average molecular weight of the resin was 56,000, and the melting point thereof was 56° C.
synthesis example 3
—Vinyl Group-Containing Organopolysiloxane Resin (A2)—
[0128]After dissolving 27 mol of organosilane represented as PhSiCl3, 1 mol of ClMe2SiO(Me2SiO)33SiMe2Cl, and 9 mol of Me2ViSiCl in a toluene solvent, a toluene solution was dropped in water and cohydrolyzed, further after cleaning with water, and neutralizing and dewatering by alkali cleaning, by stripping the solvent, a vinyl group-containing resin (A2) was synthesized.
[0129]In the resin, a constituent ratio of siloxane units which constitute the resin and a structure represented by [—SiMe2O-(Me2SiO)33—SiMe2O2 / 2] is denoted by a formula: [PhSiO3 / 2]0.27[—SiMe2O-(Me2SiO)33—SiMe2O2 / 2]0.01[Me2ViSiO1 / 2]0.09. The weight average molecular weight of the resin was 62,000, and the melting point thereof was 61° C.
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