Accuracy improvements in optical metrology

a technology of optical metrology and accuracy improvement, applied in the field of metals, can solve the problems of inability to estimate reliably the inaccuracy, consuming a significant part of the overlay metrology budget, obsolete optimization, etc., and achieve the effect of improving measurement accuracy

Inactive Publication Date: 2018-02-15
KLA TENCOR TECH CORP
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Benefits of technology

[0016]Some aspects of the present invention provide combinations o...

Problems solved by technology

In reality, however, such process variations may be quite large (especially in the research and development phase of chip development) and they may induce sizeable errors in the overlay reported by the metrology; errors that may reach the nanometer regime, thereby consuming a significant part of the overlay metrology' budget.
However, prior art methodologies do not estimate reliably the inaccuracy of the metrology in train and cannot do so at all in run time using traditional recipe optimization (e....

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  • Accuracy improvements in optical metrology
  • Accuracy improvements in optical metrology
  • Accuracy improvements in optical metrology

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Embodiment Construction

[0031]In the following description, various aspects of the present invention are described. For purposes of explanation, specific configurations and details are set forth in order to provide a thorough understanding of the present invention. However, it will also be apparent to one skilled in the art that the present invention may be practiced without the specific details presented herein. Furthermore, well known features may have been omitted or simplified in order not to obscure the present invention. With specific reference to the drawings, it is stressed that the particulars shown are by way of example and for purposes of illustrative discussion of the present invention only, and are presented in the cause of providing what is believed to be the most useful and readily understood description of the principles and conceptual aspects of the invention. In this regard, no attempt is made to show structural details of the invention in more detail than is necessary for a fundamental u...

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Abstract

Methods, metrology modules and target designs are provided, which improve the accuracy of metrology measurements. Methods provide flexible handling of multiple measurement recipes and setups and enable relating them to landscape features that indicate their relation to resonance regions and to flat regions. Clustering of recipes, self-consistency tests, common processing of aggregated measurements, noise reduction, cluster analysis, detailed analysis of the landscape and targets with skewed cells are employed separately or in combination to provide cumulative improvements of measurement accuracy.

Description

CROSS REFERENCE TO RELATED APPLICATIONS[0001]This application claims the benefit of U.S. Provisional Patent Application No. 62 / 299,535 filed on Feb. 24, 2016, which is incorporated herein by reference in its entirety.BACKGROUND OF THE INVENTION1. Technical Field[0002]The present invention relates to the field of metrology, and more particularly, to techniques that achieve better accuracy in optical metrology,2. Discussion of Related Art[0003]Various optical metrology technologies require that the process variations which cause asymmetry in the metrology signal be much smaller than some threshold, so that the part of the asymmetry signal is much smaller than the signal asymmetry caused by the overlay. In reality, however, such process variations may be quite large (especially in the research and development phase of chip development) and they may induce sizeable errors in the overlay reported by the metrology; errors that may reach the nanometer regime, thereby consuming a significan...

Claims

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Application Information

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IPC IPC(8): H01L21/66G03F7/20G06F17/30G03F9/00
CPCH01L22/20G03F9/7003G03F7/70633H01L22/12G06F17/30598G06F16/285G03F7/70616H01L22/26H01L22/24H01L22/34
Inventor BRINGOLTZ, BARAKGUREVICH, EVGENIADAM, IDOFELER, YOELALUMOT, DRORLAMHOT, YUVALSELLA, NOGADELEEUW, YARONYAZIV, TALASHWAL, ELTSAFONSALTOUN, LILACHLEVIANT, TOM
Owner KLA TENCOR TECH CORP
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