Instrument for moving and positioning of optical elements with nanometric mechanical stability and resolution in synchroton light source beamlines

Abstract

An instrument for moving and positioning of an optical element in beamlines comprises a mounting structure to which one (or more) optical element(s) is mounted, as well as a reference structure, in relation to which the mounting structure is moved by means of a moving means of low (or close to zero) mechanical stiffness and in relation to which the position of the mounting structure is metered by means of a high-resolution interferometer. The invention proposes that the instrument also comprises a balance mass for receiving the reaction force from the moving means of the mounting structure, and both the mounting structure and the balance mass are attached to the reference structure by spring means, with specific stiffness properties, allowing the positioning control of the mounting structure to be done by a control system with main feedback loop with high bandwidth (>100 Hz). In order to allow for a broader range of movement between the mounting structure and the reference structure, by means of a cascaded movement, the instrument may further comprise an intermediate structure attached to the reference structure, also preferably by spring means with specific stiffness properties, the complementary structure receiving the mounting structure and the balance mass in place of the reference structure. Such an instrument may be embodied in a new-generation synchrotron light source beamline mounted double-crystal monochromator, being sufficient for this that the spring means to be conveniently chosen, the reference structure to have a main rotation in relation to the incident beam, and in addition to the crystal mounted to the mounting structure, a complementary crystal to be mounted to the complementary mounting structure rigidly attached to the reference structure.

Description

TECHNICAL FIELD OF THE INVENTION[0001]The disclosure is related to a novel instrument for moving and positioning of optical elements with nanometric mechanical stability and resolution in synchrotron light source beamlines comprised of:[0002]a reference structure;[0003]a mounting structure, in which one (or more) optical element(s) is mounted, and is movable in relation to the reference structure;[0004]measure means of the mounting structure in relation to the reference structure;[0005]a moving means of low (or zero) mechanical stiffness, for movement of the mounting structure related to the reference structure;[0006]a balance mass, that is movable in relation to the reference structure, and undergoes the reaction force from the moving means of the mounting structure; and[0007]a control system with main feedback loop with high bandwidth (>100 Hz).[0008]An optical element of a synchrotron light source beamline which may be a mirror, a diffraction crystal, a diffraction grating, a ...

AI Technical Summary

Benefits of technology

The patent describes an instrument that can measure the position of a mounting structure relative to a reference structure with high accuracy. The instrument has a complementary structure that moves in relation to the reference structure, and the mounting structure and balance mass are attached to this complementary structure, rather than directly to the reference structure. This allows for broader movement of the mounting structure in relation to the reference structure, and increases the accuracy of the measurement. The mounting structure is attached to the complementary structure using springs, and an optical element can be attached to the mounting structure. The measurement means includes three position sensors that measure the position of the mounting structure and the complementary mounting structure, increasing accuracy between the optical elements. Overall, the instrument provides highly accurate and precise position measurements.

Problems solved by technology

Although there are many ways to select a narrow band of wavelengths (that would be perceived on the visible range as a pure color), these forms are limited due to the range of radiation energy.

The existing construction technologies of DCMs are limited in terms of stability of the relative parallelism between the crystals, that is, in the pitch and roll.

As such, the evolution achieved in stability was very limited, representing a relative stagnation of the current technology, with practically no real perspective that new demands of new generation synchrotrons could be met.

This approach is limited by the finite stiffness of the middle parts and of the mechanical connections, which quickly deteriorates the mounting effective stiffness.

In addition, the levels of stability required are so low that these adjustment mechanisms need to offer a high capability to reject disturbances (noises).

These disturbances are caused by vibrations from the ground, sources of neighboring vibrations such as vacuum pumps, and DCM internal vibration sources, such as cooling systems, motors and actuators, and bearings.

The piezoelectric and micro motor actuators currently utilized would hardly be able to achieve control bands above 20 Hz.

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