Preparation method of composite cladding material and equipment
A composite coating and composite plating technology, applied in coatings, electrolytic coatings, cells, etc., can solve the problems of uneven distribution, low percentage of non-metallic particles, low yield, etc., to increase uniformity and improve cladding strength. , the effect of improving the yield
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Embodiment 1
[0018] Cut the plated workpiece 5 of the base pure copper plate into a size of 500*700mm, and perform electrodeposition according to the following steps:
[0019] The following ingredients are configured into composite plating solution 2:
[0020] NiSO 4 ·6H 2 O 250g / L
[0021] NiCl 2 ·6H 2 O 45g / L
[0022] h 3 BO 3 30g / L
[0023] Sodium Gluconate 100g / L
[0024] Surfactant-JFC 2ml / L
[0025] Al 2 o 3 Powder (particle size≤5μm) 80g / L
[0026] ① Soak the pure copper plate in 5% sulfuric acid solution and activate it at room temperature for 1 min;
[0027] ②Clean, then install the hanger and put it into the electrolytic cell 1;
[0028] ③ Turn on the rotating device 10 to rotate the rotating anode 4, turn on the air agitator 9, and pass the pump
[0029] 6 The plating solution can be circulated, and the experiment can be carried out in the electrolytic tank. The parameters of the electroplating process are as follows:
[0030] pH 4.5
[003...
Embodiment 2
[0038] Cut the plated workpiece 5 of the base pure copper plate into a size of 500*700mm, and perform electrodeposition according to the following steps
[0039] The following ingredients are configured into composite plating solution 2:
[0040] NiSO 4 ·6H 2 O 250g / L
[0041] NiCl 2 ·6H 2 O 45g / L
[0042] h 3 BO 3 30g / L
[0043] Sodium Gluconate 100g / L
[0044] TiO 2 Powder (particle size≤5μm) 80g / L
[0045] Surfactant-JFC 2ml / L
[0046] ① Soak the pure copper plate in 5% sulfuric acid solution and activate it at room temperature for 1 min;
[0047] ②Clean, then install the hanger and put it into the electrolytic cell 1;
[0048] ③ Turn on the rotating device 10 to rotate the rotating anode 4, turn on the air agitator 9, and pass the pump 6
[0049] The plating solution can be circulated and experimented in the electrolytic tank. The electroplating process parameters are as follows:
[0050] pH 4.5
[0051] Temperature (°C) 50°C
[0052] ...
Embodiment 3
[0058] Cut the plated workpiece 5 of the base pure copper plate into a size of 500*700mm, and perform electrodeposition according to the following steps:
[0059] The following ingredients are configured into composite plating solution 2:
[0060] NiSO 4 ·6H 2 O 250g / L
[0061] NiCl 2 ·6H 2 O 45g / L
[0062] h 3 BO 3 30g / L
[0063] Sodium Gluconate 100g / L
[0064] SiC powder (particle size≤5mm) 80g / L
[0065] Surfactant-JFC 2ml / L
[0066] ① Soak the pure copper plate in 5% sulfuric acid solution and activate it at room temperature for 1 min;
[0067] ②Clean, then install the hanger and put it into the electrolytic cell 1;
[0068] ③ Turn on the rotating device 10 to rotate the rotating anode 4, turn on the air agitator 9, and pass the pump 6
[0069] The plating solution can be circulated and experimented in the electrolytic tank. The electroplating process parameters are as follows:
[0070] pH 4.5
[0071]Temperature (°C) 50°C
[0072] Curr...
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