Unlock instant, AI-driven research and patent intelligence for your innovation.

Method of raising vacuum degree in vacuum chamber fast

A technology of vacuum chamber and degree of vacuum, applied in vacuum evaporation plating, ion implantation plating, metal material coating process, etc., can solve the problems of high price, high manufacturing cost, high use cost, high use cost, and achieve low cost , The cost is fast and efficient, and the effect of improving the vacuum degree

Inactive Publication Date: 2008-07-09
INST OF MECHANICS CHINESE ACAD OF SCI
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the high price of titanium sublimation pumps and the high cost of use, resulting in significantly higher equipment manufacturing costs and use costs, it cannot be widely used in actual production and scientific research experiments.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method of raising vacuum degree in vacuum chamber fast
  • Method of raising vacuum degree in vacuum chamber fast

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0010] When the strontium titanate (STO) film is prepared in conjunction with the method of electron beam physical vapor deposition below, the method of the present invention is used to rapidly improve the vacuum degree of the vacuum chamber and carry out specific instructions:

[0011] For example, when using the electron beam physical vapor deposition method to prepare strontium titanate (STO) thin films, in order to avoid the interference and pollution of air and floating dust, there are high requirements for the vacuum degree of the vacuum chamber. When preparing strontium titanate (STO) thin film, an electron gun is installed in the vacuum chamber, and there is a tungsten filament in the electron gun. The electron beam generated by the tungsten filament is used to evaporate the source material, and the molybdenum wire is used to heat the substrate. Due to the high temperature of tungsten, The oxide vapor pressure of molybdenum and strontium is very high, and the existence ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention discloses one method of fast raising vacuum degree in vacuum chamber. The method includes evaporating metal with high activity and high stability to form metal vapor particle inside the vacuum chamber, and depositing the metal vapor particle onto the surface of metal board to form metal film capable of adsorbing gas molecules of water vapor, oxygen, hydrogen, etc to form stable solid matter. The method can raise vacuum degree in vacuum chamber fast in low cost.

Description

technical field [0001] The invention relates to a method for rapidly increasing the vacuum degree of a vacuum chamber. Background technique [0002] The vacuum chamber is one of the basic devices widely used in modern manufacturing industry and scientific research, such as the preparation of large-scale printed circuits in the electronics industry, information industry, integrated circuits, and large-area superconducting films. All have higher requirements. Leakage of the vacuum chamber, degassing of the wall of the vacuum chamber, and degassing of the evaporated material itself may lead to a rapid deterioration of the vacuum degree in the vacuum chamber during vacuum deposition. Therefore, it is necessary to take corresponding measures to quickly improve the vacuum degree in the vacuum chamber. At present, under the premise of ensuring good sealing of the vacuum chamber, the use of a titanium sublimation pump with a high pumping speed can make the vacuum chamber quickly re...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/56
Inventor 舒勇华樊菁李帅辉
Owner INST OF MECHANICS CHINESE ACAD OF SCI