Reaction and magnetically controlled sputtering process of preparing hard nanometer layered TiN/SiO2 coating

A technology of reactive magnetron sputtering and nano-multilayer, which is applied in coating, sputter plating, metal material coating technology, etc., can solve the problem of low preparation efficiency of nano-multilayer coating, achieve the improvement of preparation efficiency, Effect of increased deposition rate

Inactive Publication Date: 2008-10-08
SHANGHAI JIAOTONG UNIV
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AI Technical Summary

Problems solved by technology

[0006] Aiming at the problem of low preparation efficiency of the above nitride / oxide nano-multilayer coating, the present invention provides a reactive magnetron sputtering TiN / SiO 2 The preparation method of hard nanometer multi-layer coating, it adopts in Ar gas and N 2 Preparation of TiN / SiO by Reactive Magnetron Sputtering in Gas Mixed Atmosphere 2 Nano multi-layer coating can obtain high coating growth efficiency and meet the needs of industrial production of coatings with high hardness and excellent oxidation resistance, suitable for high-speed cutting and dry cutting tools

Method used

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Examples

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Effect test

example 1

[0023] The present invention TiN / SiO 2 The concrete process parameter of the preparation method of multi-layer coating is: Ar gas partial pressure is 0.4Pa, N 2 The gas partial pressure is 0.08Pa, the Ti target sputtering power is 220W, the deposition time is 15 seconds, SiO 2 The target sputtering power is 40W, the deposition time is 4 seconds, and the substrate temperature is 2 The thickness of the TiN layer in the multilayer coating is 4.6 nm, SiO 2 The layer thickness is 0.3 nm, and the hardness of the coating is 35.3 GPa.

example 2

[0025] The present invention TiN / SiO 2 The concrete process parameter of the preparation method of multi-layer coating is: Ar gas partial pressure is 0.4Pa, N 2 The gas partial pressure is 0.08Pa, the Ti target sputtering power is 220W, the deposition time is 15 seconds, SiO 2 The target sputtering power is 40W, the deposition time is 6 seconds, and the substrate temperature is 2 The thickness of the TiN layer in the multilayer coating is 4.6 nm, SiO 2 The layer thickness is 0.5 nm, and the hardness of the coating is 40.0 GPa.

example 3

[0027] The present invention TiN / SiO 2The concrete process parameter of the preparation method of multi-layer coating is: Ar gas partial pressure is 0.4Pa, N 2 The gas partial pressure is 0.08Pa, the Ti target sputtering power is 220W, the deposition time is 15 seconds, SiO 2 The target sputtering power is 40W, the deposition time is 14 seconds, and the substrate temperature is 2 The thickness of the TiN layer in the multilayer coating is 4.6 nm, SiO 2 The layer thickness is 1.3 nm, and the hardness of the coating is 32.6 GPa.

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Abstract

The reaction and magnetically controlled sputtering process of preparing hard nanometer layered TiN / SiO2 coating belongs to the field of tool and mold coating preparing technology. In a multiple target magnetically controlled sputtering and coating apparatus with low pressure mixed Ar and N2 atmosphere and independent RF cathodes controlled Ti target and compound SiO2 target, the substrate is made to stay alternately in the plasmas these two targets generate to form the layered coating including TiN layers formed through the reaction between Ti material and N2 gas and the SiO2 layers formed directly with the sputtered SiO2 compound and containing no nitrogen. The present invention has high efficiency, and the formed coating has high hardness and excellent antioxidant performance and is suitable for high speed cutting and dry cutting.

Description

technical field [0001] The present invention relates to a preparation method of a hard coating, in particular to a reactive magnetron sputtering TiN / SiO 2 A preparation method for a hard nanometer multilayer coating. The invention is used in the technical field of surface coating preparation of cutting tool materials. Background technique [0002] High-speed cutting with a cutting speed of ≥100m / min and dry cutting with no or less coolant are increasingly becoming the mainstream of cutting technology development due to their high machining efficiency and less environmental pollution. However, this processing technology puts forward higher requirements on the performance of the tool coating, which not only requires the tool coating to have high hardness, low friction coefficient, but also high oxidation resistance. Existing tool coatings do not fully meet these requirements. For example, the hardness of TiN coating is 23±2GPa, and the oxidation temperature is about 500°C; ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/06C23C14/54
Inventor 孔明李戈扬刘艳戴嘉维
Owner SHANGHAI JIAOTONG UNIV
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