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Accurate magnetic suspension worktable for photo etching under extra ultraviolet

A technology of extreme ultraviolet lithography and magnetic levitation, which is applied in the direction of microlithography exposure equipment, electrical components, semiconductor/solid-state device manufacturing, etc. It can solve problems such as vibration shock and wire tension, achieve stable movement, eliminate precision errors, and improve stability sexual effect

Inactive Publication Date: 2008-12-17
INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0012] In view of the contradiction between precision and stroke existing in the existing lithography precision workpiece table, as well as problems such as vibration shock and wire tension, the present invention provides a high-precision long-stroke precision positioning workpiece table suitable for extreme ultraviolet lithography vacuum environment operations , the present invention can not only realize the step-and-scan movement required in the scanning exposure process, but also improve the precision and stability of the mechanism

Method used

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  • Accurate magnetic suspension worktable for photo etching under extra ultraviolet
  • Accurate magnetic suspension worktable for photo etching under extra ultraviolet
  • Accurate magnetic suspension worktable for photo etching under extra ultraviolet

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Embodiment Construction

[0052] The present invention will be further described below in conjunction with specific embodiments.

[0053] figure 2 , image 3 It is the overall structural arrangement of the present invention. Such as image 3 As shown, the present invention includes three parts: a micro-positioning platform assembly 117 , a coarse positioning platform assembly 125 and a base assembly 132 . The main body of the base assembly 132 is composed of the base 101 and two Y-direction maglev guide rails 102a, 102b fixed at both ends of the base. A Y-direction linear motor primary 110 and two magnetic strips 109a, 109b are mounted on the upper surface of the base 101 . The main body of the coarse positioning platform assembly 125 includes the walking beam 103 , the cable table 107 and the counterweight 108 . The coarse positioning stage assembly 125 is supported by the base assembly 132 through the magnetic levitation guide rail 102 . A Y-direction linear motor secondary 116 and two magnets...

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Abstract

The worktable is composed of fine positioning platform module, coarse positioning platform module and base module. Base module is located at bottom most. Being located above the base module, coarse positioning platform module can be moved related to base module along Y direction. Through magnetic suspension guide track, the base module supports the coarse positioning platform module. Being located above the coarse module, fine positioning platform module through magnetic suspension guide track supported by the coarse module can be moved related to the coarse module along X direction. Cable desk, balancing piece and electromagnet can reduce position error and increase rigidity of work head effectively. The invention can realize XY linear motion, and fine motions in 6D: X, Y, Z,ª’X, ª’Y, ª’Z. Features are: simple structure, good rigidity, low energy consumption and high precision. The invention is suitable to photo etching under extra ultraviolet etc.

Description

technical field [0001] The invention relates to extreme ultraviolet lithography equipment, in particular to a precision magnetic levitation workpiece table for extreme ultraviolet lithography. Background technique [0002] Projection lithography technology is a cutting-edge technology in IC lithography processing. It uses the synchronous movement of the mask table and the workpiece table to project the graphics on the mask onto the resist-coated wafer through the miniature optical system, and then After shaping, developing and other processes, the graphics with reduced magnification are finally copied on the wafer. Scanning exposure is different from one-time full exposure. It uses the uniform linear scanning of the conventional narrow slit image field to realize continuous moving exposure in the large chip size image field. The projection error and aberration can be reduced due to the image field equalization; in addition The continuous automatic leveling and focusing of e...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H01L21/00
Inventor 朱涛李艳秋
Owner INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
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