Partial vacuum packaging method for resonant mode pressure sensor chip
A pressure sensor and partial vacuum technology, applied in the direction of instruments, microstructure devices, processing microstructure devices, etc., can solve the problems of local temperature rise, influence of vacuum degree, and less gas molecules in the vacuum chamber, so as to reduce the fracture of movable parts , Improve the yield, improve the effect of adhesion
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[0045] Specific embodiments of the present invention are not limited to the following description. The method of the present invention will be further described below in conjunction with the accompanying drawings.
[0046]1. Prepare a TiW / Au ring 3 with a thickness of 10-20 μm and a ring width of 100-200 μm on the sensor silicon wafer 5 to be subjected to deep groove etching on the back side and release movable parts on the front side, and perform deep groove etching and release of movable parts. The steps in part 6 include:
[0047] (1) The silicon chip 5 of the sensor to be subjected to deep groove etching on the back and release of the movable parts on the front figure 1 as shown, figure 1 1 in the figure indicates that silicon is prepared to be etched on both sides of the sensor resonant beam to release the area where the resonant beam is formed, and 2 indicates the area on the back of the sensor chip where a deep groove is prepared to etch silicon. Clean the sensor sil...
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