Programming and erasing method for non-volatile memory

A non-volatile, programming method technology, applied in the field of non-volatile memory, can solve the problems of long time-consuming operation procedures, large silicon area of ​​the convergence circuit, etc., to achieve the effect of reducing burden, increasing density and size, and low programming voltage

Inactive Publication Date: 2007-07-18
YIELD MICROELECTRONICS CORP
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  • Application Information

AI Technical Summary

Problems solved by technology

However, this method requires not only a large silicon area but also a long time-consuming operation procedure for converging circuits

Method used

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  • Programming and erasing method for non-volatile memory
  • Programming and erasing method for non-volatile memory
  • Programming and erasing method for non-volatile memory

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Embodiment Construction

[0056] Next, some embodiments will be described in detail. It is to be noted, however, that the invention may be practiced in a wide range of other embodiments than those expressly stated, and that the scope of the invention is not limited to these embodiments, but rather should be determined in accordance with the scope of the claims. In addition, parts of various devices are not shown to scale. The dimensions of the above-mentioned related components are enlarged, and meaningless parts are not shown, so that the present invention can be described and understood more clearly.

[0057] The present invention includes methods and diagrams for achieving high-speed low-voltage programming and self-converging high-speed low-voltage erasing in nonvolatile memory. These techniques will be understood by describing the embodiments of the present invention, wherein the methods and diagrams are for explaining the embodiments rather than limiting the present invention.

[0058] Figure 3...

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Abstract

The present invention provides a high-speed low-voltage programming scheme and self-convergent high-speed low-voltage erasing schemes for Electrically Erasable Programmable Read-Only Memories. For the N-type Field Effect Transistor based NVM programming, an elevated source voltage to the substrate can achieve high efficient Drain-Avalanche-Hot-Electron Injection into the floating gate resulting in high-speed and low-voltage operations. The self-convergent and low-voltage erasing can be achieved by applying Drain-Avalanche-Hot Hole Injection with the conditions of restricted maximum drain current and a moderate control gate voltage enough to turn on the NFET. For the p-type FET based EEPROM programming, a negative source voltage relative to the substrate can achieve high efficient Drain-Avalanche-Hot-Hole Injection into the floating gate resulting in high-speed and low voltage operations. The self-convergent and low voltage erasing can be achieved by applying Drain-Avalanche-Hot-Electron Injection with the conditions of restricted maximum magnitude of drain current and a negative moderate control gate voltage enough to turn on the PFET.

Description

technical field [0001] The present invention relates to a non-volatile memory (NVM), in particular to a non-volatile memory programming (programming) and erasing method, in order to achieve high-speed low-voltage programming operation and self-convergent (self-convergent) high-speed low-voltage Erase operation. Background technique [0002] The data storage mechanism of non-volatile memory depends on the ability to hold electric charge for a long time. Charge is stored in the polysilicon floating gate of the metal oxide semiconductor (MOS) device. Charge is transferred from the silicon substrate through the insulator to the floating gate. [0003] Semiconductor nonvolatile memory, especially electrically erasable nonvolatile memory, is widely used in electronic devices or equipment in various fields, from computers to telecommunications equipment, consumer equipment, and subscriber identification (SIM) on mobile phones Card. The EEP non-volatile memory is usually used as...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G11C16/10G11C11/56
CPCG11C16/10G11C16/14G11C16/0416H01L29/7885
Inventor 黄文谦王立中林信章张浩诚
Owner YIELD MICROELECTRONICS CORP
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