Production of high-brightness light-emitting diodes chip
A light-emitting diode, high-brightness technology, applied in electrical components, circuits, semiconductor devices, etc., can solve the problems of reducing yield, damage, cracking, etc., to improve the pass rate, avoid damage, and increase production efficiency.
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[0024] The invention uses the photoresist as the corrosion protection layer, and through the methods of selective exposure, development and chemical corrosion, completes the negative pole of the GaAs substrate and separates the positive pole of the light-emitting diode chip. Specifically, after the conventional LED process is done, the following steps are carried out before testing:
[0025] 1. Uniform glue: evenly coat positive photoresist on the surface of the LED epitaxial wafer. Carry out on the homogenizer, the speed of the homogenizer is 4000 rpm, and the time is 20 seconds.
[0026] 2. Baking: put the light-emitting diode epitaxial wafer coated with positive photoresist into an oven, and bake at a temperature of 100-150 degrees for 10-30 minutes.
[0027] 3. Exposure: exposure on a UV lithography machine, the mask pattern is shown in Figure 5, align with the original electrode pattern, and expose in the exposure area 8 with a width of 20 to 50 microns between each chip...
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