Method for preparing orderly anode alumina through-hole template by using anodic oxidation bath

A technology of anodized aluminum and anodic oxidation, which is applied in the direction of anodic oxidation, can solve the complex process, affect the preparation of nanostructures on the substrate, pollution and other problems, and achieve the effect of simple process engineering

Inactive Publication Date: 2007-09-19
INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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  • Claims
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Problems solved by technology

However, the porous alumina template needs to be transferred to the substrate surface, which requires complex process and pollution. Moreover, it is difficult to meet the technical requirements if the ultra-thin porous alumina template is to be obtained, which affects the preparation of nanostructures on the substrate.

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  • Method for preparing orderly anode alumina through-hole template by using anodic oxidation bath
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  • Method for preparing orderly anode alumina through-hole template by using anodic oxidation bath

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Embodiment

[0048] 1. The core idea of ​​the present invention is to vapor-deposit aluminum on a semi-insulating GaAs substrate for in-situ anodic oxidation, and adopt a three-step anodic oxidation method to obtain uniform and orderly oxidation on the GaAs substrate by improving the flatness of the surface. Aluminum formwork.

[0049] 2. Fig. 1 is a structural representation of an anodic oxidation bath of the present invention; it is a device for in-situ anodic oxidation on a semi-insulating GaAs substrate;

[0050]Design of in-situ anodic aluminum oxidation device for semi-insulating GaAs substrates: the anodizing device is used for in-situ anodizing on semi-insulating GaAs substrates to form ordered through-hole templates, and a glass electrolytic cell 1 is designed. There is a round hole 11 on the side wall of the electrolytic cell 1; a fixed ring 4, which is fixed on the outer side wall of the round hole 11 on the electrolytic cell 1; a movable ring 5, which is fixed with a screw 3 T...

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Abstract

A method for producing ordered anode alumina hole plate using anode oxidation bath, is characterized in that, includes the steps of: 1) taking out a substrate; 2) evaporating metal aluminium film on the substrate; 3) fixing the substrate with etal aluminium film in anode oxidation groove; 4) evaporating the substrate with etal aluminium film to anodize it in the electrolytic solution in anode oxidation groove; 5) placing the oxidated substrate into orthophosphoric acid solution, corroding and enlarging hole, and forming anode alumina hole plate.

Description

technical field [0001] The invention relates to an anodic oxidation method for evaporating an aluminum film on a semi-insulating GaAs substrate. More precisely, it is a method for preparing ordered anodized aluminum through-hole templates using an anodizing bath. Background technique [0002] Low-dimensional structure materials have the characteristics of quantum size effect, quantum tunneling and Coulomb blocking effect, and nonlinear optical effect. They are the basis of a new generation of solid-state quantum devices. There are important application prospects. And with the further reduction of dimensions, theoretically speaking, the performance of one-dimensional quantum wire and zero-dimensional quantum dot materials is more superior than that of quantum well materials, so it has attracted more attention. [0003] The preparation of high-quality GaAs-based quantum dot materials is the basis for the application of quantum dot devices and integrated circuits. How to real...

Claims

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Application Information

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IPC IPC(8): C25D11/04
Inventor 周慧英曲胜春徐波张春林王占国
Owner INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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