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Polysilazane-treating solvent and method for treating polysilazane by using such solvent

A polysilazane and solvent technology, which is applied in the field of polysilazane treatment solvents, can solve the problems that polysilazane cannot be cleaned or peeled off satisfactorily, film separation, cracks, etc., and achieve excellent polysilazane Solubility effect

Active Publication Date: 2008-01-23
MERCK PATENT GMBH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the known disadvantage of this method is that when the polysilazane solution is spin-coated on the substrate, beads are formed on the periphery of the substrate and the solution flows to the back of the substrate
However, the disadvantage of using a common cleaning or stripping solution is that, in some cases, polysilazane cannot be cleaned or stripped satisfactorily, or even if satisfactory cleaning or stripping of polysilazane can be performed, Clogging of waste lines can also occur in coating equipment due to gelation of waste liquid in waste tanks or generation of gases such as silane, hydrogen or ammonia
This bump can lead to cracks or membrane separation when the membrane is fired

Method used

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  • Polysilazane-treating solvent and method for treating polysilazane by using such solvent
  • Polysilazane-treating solvent and method for treating polysilazane by using such solvent
  • Polysilazane-treating solvent and method for treating polysilazane by using such solvent

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Experimental program
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Effect test

Embodiment 1-26 and comparative example 1-7

[0065] Provide the processing solvent and polysilazane shown in Table 1, that is, perhydropolysilazane as described in Reference Examples 1-3 of Patent Document 1, polysilazane to which methanol is added, and hexamethylsilazane to which A polysilazane based disilazane, and an aluminum-containing polysilazane as described in Example 1 of Patent Document 2. For free-standing polysilazane, the days required for gelation, the amount of gas released, and the properties of the edge-cut portion were evaluated as follows.

[0066] (method for assessing the number of days required to gel)

[0067] A 20 wt % solution (5 g) of each polysilazane compound in di-n-butyl ether and 50 g of a processing solvent were placed in a glass bottle (100 g) and mixed together. In a room under the conditions of 22° C. and 50% RH, the glass bottle was opened and placed, and the number of days required for the gel was visually observed. Generally, the number of days required for gelation is preferably 2...

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Abstract

The present invention relates to a polysilazane treatment solvent which has excellent solvency and stability, has no influence on the performance of the substrate and polysilazane as the bottom layer, has a good cutting edge shape, and is highly safe to the human body of. The processing solvent contains a solvent selected from the group consisting of tetralin, p-menthane, p-cumylmethane, α-pinene, 1,8-cineole and mixtures thereof, and also relates to a process using the solvent Polysilazane treatment method. The solvent may also contain a solvent selected from the group consisting of aliphatic hydrocarbons, alicyclic hydrocarbons, and mixtures thereof.

Description

technical field [0001] The present invention relates to a polysilazane treating solvent suitable for treating a polysilazane coating film or a polysilazane film or the like formed on a substrate, and treating a polysilazane compound or polysilazane using the solvent The treatment method of alkane coated film. More specifically, the present invention provides a polysilazane treating solvent, and a treating method suitable for removing edge beads, wherein after a polysilazane coating film is formed on a substrate, the coating film at its edge portion is treated. Background technique [0002] Silicon films are known to be used as insulating films, dielectric films, protective films, hydrophilic films, and the like. These siliceous films are formed on the substrate by various methods such as PVD method (such as sputtering method), CVD method, sol-gel method, and forming polysiloxane coating film or polysilazane coating film And a method of converting the coated film into a sil...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09D9/00C11D7/24C11D7/26C11D7/50B05D7/24C01B21/068C08G77/62H01L21/312
CPCC11D7/24C11D7/26H01L21/02087C09D7/001C11D7/50C09D183/16H01L21/02222C09D7/20C09D9/00
Inventor 松尾英树一山昌章石川智规青木宏幸布鲁斯·凯克约瑟夫·奥伯兰德
Owner MERCK PATENT GMBH
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