Method for preparing high purity oxygen by double-tower low temperature rectification

A low-temperature rectification and high-purity oxygen technology, which is applied in oxygen preparation, refrigeration and liquefaction, lighting and heating equipment, etc., can solve the problems of small production scale and high price of adsorption materials, and achieve low cooling loss and heat exchange effect Good, guaranteed removal of impurities

Inactive Publication Date: 2008-03-26
WUHAN HUAXING IND & TECH +1
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Problems solved by technology

[0003] High-purity oxygen is produced by normal temperature adsorption method, and its technical indicators can meet the requirements of high-purity oxygen for electronic grade, but the requirements for raw material oxygen

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  • Method for preparing high purity oxygen by double-tower low temperature rectification

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Embodiment Construction

[0026] The present invention will be discussed in more detail below with reference to the accompanying drawings of examples. Now see Figure 1,

[0027] The method for preparing high purity oxygen by double-tower cryogenic rectification includes:

[0028] a. Two structured packing rectification towers with condenser D at the top and evaporator C at the bottom, I rectification tower and II rectification tower, each rectification tower is divided into three rectification sections, the upper, middle and lower sections. A main heat exchanger B is provided outside the distillation tower;

[0029] b. The raw material of industrial liquid oxygen 1 with a pressure of 0.2MPa and a temperature of 95K is directly introduced into the middle section of the I rectification tower, and through low-temperature rectification in the tower, the resulting pressure is 0.13MPa, the temperature is about 93K, and the components containing 7.5% argon Gas 2 is discharged from the top of the tower, resulting ...

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Abstract

The present invention provides double tower low temperature rectification process of preparing high purity oxygen. Industrial liquid oxygen material with oxygen content of 99.6 % is low temperature rectified in two structured packing towers to obtain electronic industry level high purity oxygen of oxygen content not lower than 99.9998 % and impurity contents including N2 not more than 0.5 ppm, CH4 not more than 0.1 ppm, H2O not more than 0.1 ppm, and Ar not more than 0.5 ppm. The process of preparing high purity oxygen has best utilization of energy, low cold loss, low power consumption and low cost, and is suitable for industrial production.

Description

Technical field [0001] The invention relates to the field of oxygen production by cryogenic rectification, and in particular to a method for preparing high-purity oxygen by double-tower cryogenic rectification. Background technique [0002] The use of cryogenic distillation to prepare high-purity oxygen is a mature industrial method, but it is currently attached to the cold box of large-scale air separation equipment, and single-tower distillation is used to prepare high-purity oxygen. There is no independent general industry Oxygen equipment for producing and purifying oxygen. Because it adopts single-tower distillation, its purity technical index can only meet the requirements of GB / T14599-93 "High Purity Oxygen", and the oxygen purity is ≥99.999%. Other impurity content: N 2 ≤5ppm; CH 4 ≤0.5ppm; H 2 O≤2.5PPm; Ar≤2ppm. This kind of high-purity oxygen cannot meet the technical requirements for oxygen purity of the electronics industry. [0003] The high-purity oxygen is prepared...

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Application Information

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IPC IPC(8): C01B13/02
CPCF25J3/08F25J2200/02F25J2200/30F25J2210/42F25J2215/56F25J2220/50F25J2220/52F25J2270/904
Inventor 张世田鲁仲水
Owner WUHAN HUAXING IND & TECH
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