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Process for producing color filter, color filter, liquid crystal display element, and liquid crystal display device

A technology for a liquid crystal display element and a manufacturing method, which can be applied in the direction of optical filters, etc., can solve the problems of increased processing steps, complex dry etching treatment, difficult separation wall surface roughness, etc., and achieves the effect of improving fine unevenness.

Inactive Publication Date: 2008-06-04
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this method, a complicated dry etching process is required, and the process steps are increased, so that not only the manufacturing cost is consumed, but also it is difficult to adjust the surface roughness of the partition wall to a predetermined roughness.

Method used

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  • Process for producing color filter, color filter, liquid crystal display element, and liquid crystal display device
  • Process for producing color filter, color filter, liquid crystal display element, and liquid crystal display device
  • Process for producing color filter, color filter, liquid crystal display element, and liquid crystal display device

Examples

Experimental program
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Effect test

Embodiment

[0373] Examples are given below to describe the present invention more specifically. The present invention is not limited by these examples. In addition, unless otherwise specified, "%" and "part" mean "mass%" and "mass part", and "molecular weight" means a weight average molecular weight.

Embodiment A1

[0376] [Production of dark photosensitive transfer material K1]

[0377] On a polyethylene terephthalate film (manufactured by Teijin DuPont Film Co., Ltd., Tetron (registered trademark) G2) temporary support with a thickness of 16 μm, the following dark-colored composition was applied and dried using a slit-shaped nozzle K1. In this way, a dark photosensitive resin layer with a dry film thickness of 2.2 μm was provided on the temporary support, and finally a protective film (polypropylene film with a thickness of 12 μm) was pressure-bonded.

[0378] In this way, a dark photosensitive transfer material in which the temporary support body and the dark photosensitive resin layer were integrated was produced, and the sample name is dark photosensitive transfer material K1.

[0379] [Preparation of dark compositions]

[0380] The dark composition can be obtained as follows, that is: at first by measuring the carbon black dispersion and propylene glycol monomethyl ether acetate o...

Embodiment A2

[0456] The temporary support used in Example A1 was changed to a polyethylene terephthalate film (manufactured by Teijin DuPont Film Co., Ltd., Tetron (registered trademark) G2) with a thickness of 50 μm. In the same way as Example A1, a color filter with an ITO transparent electrode was fabricated.

[0457] Ink constituting each pixel of the color filter obtained in this way was properly accommodated in the dark-colored partition wall gap, and defects such as color mixing with adjacent pixels were not found.

[0458] This is probably because the wettability of the ink on the surface of the partition wall is lowered by using the present invention. In addition, the ITO resistance of the color filter was measured (Mitsubishi Petrochemical "Loresta", sheet resistance was measured by the four-probe method), and it was 17Ω / □. The results are shown in Table 1.

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Abstract

The present invention provides a method for manufacturing a color filter, which is a color filter having two or more pixel groups of mutually different colors on a substrate, and each pixel constituting the pixel group is isolated from each other by a dark-colored partition wall. A method for manufacturing a sheet, characterized in that the method includes: a step of forming partition walls; a step of applying liquid droplets made of a colored liquid composition between the partition walls to form pixels between the partition walls; The steps include: a step of laminating a photosensitive transfer material on a substrate and a step of exposing the photosensitive transfer material in a state where the photosensitive transfer material remains on a temporary support; or forming a layer composed of a photosensitive composition on a substrate process and the process of exposing the layer made of photosensitive composition in the state of having an oxygen barrier film layer thereon; or the process of forming a layer made of dark photopolymerizable composition on the substrate and the process of Next is the step of exposing the layer composed of the dark-colored photopolymerizable composition. Moreover, the color filter obtained by this method, the liquid crystal display element provided with this color filter, and the liquid crystal display device provided with this liquid crystal display element are also provided.

Description

technical field [0001] The present invention relates to a manufacturing method of a color filter, a color filter, a liquid crystal element, and a liquid crystal display device, and particularly relates to a substrate having two or more pixel groups of mutually different colors, and the pixels constituting the pixel group are arranged in dark colors. Partition wall isolation, a method of manufacturing a color filter formed by injecting liquid droplets into a partition wall by inkjet or the like, a color filter, a liquid crystal display element including the color filter, and a liquid crystal display device including the liquid crystal display element. Background technique [0002] A color filter for a display device is a structure in which red, green, and blue dot pixels are arranged in a matrix on a substrate such as glass, and the boundaries are divided by dark-colored partition walls such as a black matrix. As a method of manufacturing such a color filter, the following me...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/20
Inventor 伊藤英明柏木大助
Owner FUJIFILM CORP
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