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Electrochemical etching liquid and etching method

An etching solution and electrochemical technology, which is applied in the field of electrochemical etching solution and etching, can solve the problems of slow etching speed, poor effect, and difficult processing of aluminum materials, and achieve the effect of speeding up and reducing side erosion

Inactive Publication Date: 2008-07-02
BYD CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

There is no harm to the environment and operators in this method, but the etching speed of this method is still relatively slow, and the efficiency is low during industrialized mass production, and when etching with this etching solution, it is difficult to perform etching for aluminum plates with less thickness. The side erosion phenomenon is small during etching, but as the thickness of the aluminum plate increases, the side erosion phenomenon also becomes more serious
Therefore, it is more difficult to deal with thicker aluminum materials, and the effect is not good.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0016] The preparation method of the etching solution provided by the present invention includes dissolving the surfactant in water, and then mixing it evenly with sulfuric acid and phosphoric acid. Since sulfuric acid generates a large amount of heat in contact with water, it is preferable to slowly add sulfuric acid to the aqueous solution containing the surfactant. In addition, preferably, it also includes adding a slow-release agent to the etching solution, and the slow-release agent is preferably dissolved in water before adding sulfuric acid.

[0017] According to the present invention, the electrochemical etching method uses aluminum or aluminum alloy material as an anode and a lead plate as a cathode, and the anode and cathode are placed in an etching solution for electrolytic etching. Wherein, the power supply of the electrolytic etching is a DC power supply, and the current can be 5.0A / dm 2 -15.0A / dm 2 . The etching can be carried out at normal temperature, but th...

Embodiment 1

[0021] This embodiment illustrates the electrochemical etching solution and etching method provided by the present invention.

[0022] 0.7 gram of sodium dodecylsulfonate is dissolved in 20 milliliters of water, then slowly add 107 grams of sulfuric acid (concentration is 98%, chemically pure), 573 grams of phosphoric acid (concentration is 55%, chemically pure), mix Evenly, the etching solution is obtained. The content of sulfuric acid in the etching solution was 15% by weight, the content of phosphoric acid was 45% by weight, and the content of sodium dodecylsulfonate was 0.1% by weight.

[0023] Put the etching solution in the electrolytic tank, heat the electrolytic tank with a water bath to keep the etching solution at 40°C, use the aluminum plate as the anode and the lead plate as the cathode, place the anode and the cathode in the etching solution, and set the current of the DC power supply to 10A / dm 2 , and then turn on the power for etching, observe and record the t...

Embodiment 2

[0029] This embodiment illustrates the electrochemical etching solution and etching method provided by the present invention.

[0030] 2.1 grams of dodecylsulfonic acid are dissolved in 38 milliliters of water, then slowly add 178 grams of sulfuric acid (concentration is 98%, chemically pure), 382 grams of phosphoric acid (concentration is 55%, chemically pure), mix well , that is, the etching solution. The content of sulfuric acid in this etching solution was 25% by weight, the content of phosphoric acid was 30% by weight, and the content of dodecylsulfonic acid was 0.3% by weight.

[0031] Put the etching solution in the electrolytic tank, heat the electrolytic tank with a water bath to keep the etching solution at 50°C, use the aluminum plate as the anode and the lead plate as the cathode, place the anode and the cathode in the etching solution, and set the current of the DC power supply to 12A / dm 2 , and then turn on the power for etching, observe and record the time for...

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PUM

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Abstract

An electrochemical etching solution is an aqueous solution containing sulfuric acid and phosphoric acid, wherein the etching solution also contains a surfactant. The electrochemical etching solution and the etching method provided by the invention can greatly increase the etching speed and reduce the occurrence of side etching phenomenon.

Description

technical field [0001] The invention relates to an etching solution and an etching method, in particular to an electrochemical etching solution and an etching method. Background technique [0002] The principle of etching is to quickly dissolve and remove unwanted metals by using chemical solutions to corrode metals. The basic process of etching is to take the required pictures and make negatives, then expose them to ultraviolet radiation on the exposure table, print the pattern on the screen coated with photosensitive material, and then print the pattern on the metal surface by screen printing method. Selective corrosion is carried out with etching solution, and after removing the film, anodizing, cleaning, and drying, the metal material with graphics and text on the surface can be obtained, and a protective film can be further sprayed on the metal surface as required. This etching method is widely used in the treatment of metal surfaces in manufacturing and decoration ind...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25F3/04
Inventor 秦学陈梁宫清
Owner BYD CO LTD
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