A preparation method for ultra-high density perpendicular magnetic recording medium
A perpendicular magnetic recording, ultra-high density technology, applied in the direction of coating with magnetic layer, record carrier manufacturing, sputtering coating, etc. Problems such as vertical film surface orientation
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[0013] The preparation process conditions in Figure 1 are: the background vacuum degree of the sputtering chamber is 1×10 -5 Pa, the argon (99.99%) pressure during sputtering is 0.9 Pa, the substrate is rotated at a rate of 9 r / min, and the substrate temperature is maintained at 100°C. After deposition, for [FePt(5 Ȧ) / Au(2.5 Ȧ)] 10 The multilayer film is annealed, the annealing condition is 470°C / 1 hour, and the background vacuum degree of the annealing furnace is 2×10 -5 Pa;
[0014] The preparation process conditions of Figure 2 are: the background vacuum degree of the sputtering chamber is 3×10 -5 Pa, the argon (99.99%) pressure during sputtering is 1.2 Pa, the substrate is rotated at a rate of 18r / min, and the substrate temperature is maintained at 200°C. After deposition, for [FePt(10 Ȧ) / Au(15 Ȧ)] 10 The multilayer film is annealed, the annealing condition is 550°C / 30 minutes, and the background vacuum degree of the annealing furnace is 4×10 -5 Pa;
[0015] The prep...
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