Gradient method preprocessing technique for depositing CVD diamond film on hard metal surface

A technology of surface deposition and diamond film, applied in metal material coating process, gaseous chemical plating, coating, etc., can solve the problem of uneven deposition and unevenness of Co removal at edges and sharp corners, affecting the cutting performance of tools, etc. problem, to achieve the effect of good bonding performance, good quality and easy cleaning

Inactive Publication Date: 2008-07-16
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
View PDF0 Cites 23 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to solve the problem that the existing pretreatment process is easy to cause uneven Co removal at edges and sharp corners during Co removal, resulting in uneven deposition and affecting the cutting performance of tools, and to invent a CVD diamond deposited on the surface of cemented

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Gradient method preprocessing technique for depositing CVD diamond film on hard metal surface
  • Gradient method preprocessing technique for depositing CVD diamond film on hard metal surface
  • Gradient method preprocessing technique for depositing CVD diamond film on hard metal surface

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0017] The present invention will be further described below in conjunction with embodiment.

[0018] A gradient method pretreatment process for depositing CVD diamond film on the surface of cemented carbide. The process is: (1) polishing → (2) cleaning → (3) etching WC → (4) cleaning → (5) first engraving Etching Co → (6) Cleaning → (7) Drying → (8) Coating → (9) Second etching of Co → (10) Cleaning → (11) Sol → (12) Planting; Polish the turning tool on the tool grinder (step 1), then clean the polished turning tool with an ultrasonic cleaner at room temperature (step 2) for one to three times, the cleaning solution is deionized water (distilled water is also available), each time 5min. Put the cleaned turning tool into a plastic container, pour the etching WC solution prepared by potassium ferricyanide, potassium hydroxide and water according to 1:1:10 (the same formula as the prior art can also be used) In the plastic container, the liquid level exceeds the turning tool b...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a pretreatment process for a CVD diamond film deposited on a hard alloy surface by adopting a gradient method in view of the problems of low intensity of the seamed edges and sharp corners, affecting the product performance and even the corrosion of seamed edges and sharp corners and so on caused by the faster removal of Co on the seamed edges and the sharp corners than Co on a face in the pretreatment process of the existing CVD diamond films deposited on a hard alloy surface; the main process procedures are provided in sequence as follows: polishing (1) arrow cleaning(2) arrow etching of WC (3) arrow cleaning(4) arrow first etching of Co(5) arrow cleaning(6) arrow drying (7) arrow glue spreading (8) arrow second etching of Co(9) arrow cleaning(10) arrow sol(11) and seeding with diamond powder (12), particularly, the gluing technique of the procedures ensures that the hard alloy surface meets the deposit demands of the CVD diamond films after being pretreated and at the same time, the Co content of the seamed edges and the sharp corners of the hard alloy product and the removal Co content on the face are caused to be basically consistent, which ensures the intensity of the seamed edges and the sharp corners and improves the performance of the CVD diamond films.

Description

technical field [0001] The invention relates to a pretreatment process before depositing a CVD diamond film on the surface of a hard alloy, especially a pretreatment process that can ensure the strength of edges and sharp corners to improve the adhesion performance of the CVD diamond film, specifically a pretreatment process A gradient pretreatment process for depositing a CVD diamond film on the surface of a cemented carbide. Background technique [0002] At present, the mechanical, thermal, acoustic, electrical, optical and chemical properties of chemical vapor deposition (CVD) diamond have reached or approached those of natural diamond, and have broad application prospects in today's high-tech fields. As a widely used wear-resistant material, cemented carbide is widely used in many industrial fields. Depositing a layer of CVD diamond coating on the surface of cemented carbide products can further improve the wear resistance of cemented carbide products. Co in cemented c...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23C16/02C23C16/27
Inventor 左敦稳卢文壮徐锋黎向锋杨春任卫涛袁佳晶黄铭敏吴小军蒋艳王珉
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap