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Magnetic current change polishing solution circulating device capable of long-time steadily polishing solution performance

A technology of magnetorheological polishing and polishing fluid, which is applied in the field of magnetorheological polishing, can solve problems such as no control, difficult high-precision optical parts modification and polishing, and change of magnetorheological polishing fluid, so as to achieve consistent removal function models, Effect of improving long-term stability and maintaining temperature stability

Inactive Publication Date: 2008-08-27
NAT UNIV OF DEFENSE TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In 2001, COM applied for the patent (USP862245) of the magnetorheological fluid transmission system by measuring the pressure loss and flow rate to calculate and control the viscosity of the magnetorheological fluid, so as to realize the stability control of the magnetorheological fluid performance, but its The stable control of the performance of the magnetorheological polishing fluid is only limited to the processing state, so it is difficult to carry out long-term intermittent repeated processing, and the measurement of the viscosity of the magnetorheological polishing fluid requires simultaneous detection of the pressure and flow of the liquid, pressure and flow The error will be introduced into the viscosity, so the accuracy is limited
This method of processing without controlling the performance of the magnetorheological fluid cannot take away the processing heat and grinding debris. With the evaporation and deterioration of the moisture in the magnetorheological polishing fluid during processing, the performance of the magnetorheological polishing fluid changes, making it incapable of deterministic and precise magnetorheological polishing
During the research process of magnetorheological polishing technology, Harbin Institute of Technology established a circulation device for controlling the stable performance of magnetorheological polishing fluid in processing. The recycling of the polishing liquid is realized, but because it also uses the pressure loss and flow rate to monitor the liquid viscosity, and its device uses a diaphragm pump with a large pulsation as the power source of the circulation system, the ejection of the magnetorheological polishing liquid is unstable and continuous; The recovery device uses the copper sheet to contact the polishing wheel to block the flow of the magnetorheological polishing fluid for recycling, which is easy to rub and scratch the surface of the polishing wheel, affecting the surface quality and roundness of the polishing wheel; the control system only controls the viscosity of the magnetorheological polishing fluid. Closed-loop control does not control the flow rate of magnetorheological polishing fluid that affects the stability of the processing process during the processing process, and the temperature of the magnetorheological polishing fluid in the cycle is not controlled, which is difficult to be used for modifying and polishing high-precision optical parts
[0005] The existing method for stabilizing the performance of magnetorheological polishing fluid is usually to measure the pressure loss and liquid flow of magnetorheological polishing fluid along the way to calculate the viscosity of magnetorheological polishing fluid, and to stabilize the magnetorheological polishing fluid by controlling the viscosity of magnetorheological polishing fluid. The performance of magnetorheological polishing fluid, this method is not only complicated, but also because the detection of viscosity will be affected by the accuracy of pressure measurement and flow measurement at the same time, the error is large
Moreover, the viscosity characteristic of the magnetorheological polishing fluid is to characterize the performance of the magnetorheological polishing fluid from the performance of the fluid, which is not directly related to the shear stress of the magnetorheological polishing fluid on the optical material in the polishing area in magnetorheological polishing. Therefore, it cannot fully reflect the material removal characteristics of the polishing fluid in magnetorheological polishing

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  • Magnetic current change polishing solution circulating device capable of long-time steadily polishing solution performance
  • Magnetic current change polishing solution circulating device capable of long-time steadily polishing solution performance
  • Magnetic current change polishing solution circulating device capable of long-time steadily polishing solution performance

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Embodiment Construction

[0045] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments.

[0046] like figure 1 As shown, a magneto-rheological polishing liquid circulation device of the present invention that can stabilize the performance of the polishing liquid for a long time includes a liquid mixing tank 3 connected to each other through pipelines, a power pump 4, an electromagnetic flowmeter 9, a nozzle 15, and a recovery device 11. Recovery pump 8, cooling machine 13, water tank 6 and computer 2, power pump 4 is connected to liquid mixing tank 3, liquid mixing tank 3 is connected to water tank 6 through metering pump 5, cooling machine 13 is mixed with liquid through cooling pipeline 16 The tanks 3 are connected; the liquid mixing tank 3, the electromagnetic flowmeter 9, the nozzle 15, the recovery device 11 and the recovery pump 8 which are sequentially connected through the polishing circulation pipeline 17 form a p...

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Abstract

The invention discloses an MR polishing slurry cycle device which has longtime and stable polishing slurry performance. The liquid mixture tin is connected with the water tank through a metering pump and the cooling machine is connected with the liquid mixture tin through the cooling pipe; a polishing slurry circulation loop consists of the successively connected liquid mixture tin, electromagnetic flow meter, nozzle, recovery unit and recovery pump through a polishing circulation pipeline and a non-polishing slurry circulation loop consists of the successively connected liquid mixture tin and electromagnetic flow meter through a non-polishing circulation pipeline. The polishing slurry circulation loop and the non-polishing slurry circulation loop are connected in parallel and a switching control valve is arranged at the junction. The lateral pipe between the liquid mixture tin and the switching control valve is surrounded with spiral coil; the electromagnetic flow meter and the spiral coil are connected with the input terminal of the computer, of which the control output terminal is connected respectively with the switching control valve, the cooling machine, the power pump and the metering pump. The device has the advantages of high control precision, sound stability, etc., and can provide low cost, reliable and stable MR polishing slurry for MR polishing processing for a long time.

Description

technical field [0001] The invention mainly relates to the technical field of magnetorheological polishing, in particular to a magnetorheological polishing fluid circulation device capable of stabilizing the performance of the polishing fluid for a long time. Background technique [0002] Deterministic magnetorheological polishing technology is an advanced optical manufacturing method proposed by combining electromagnetics, fluid dynamics, and analytical chemistry. It is one of the effective means of processing aspheric optical parts. It can obtain high-precision optical surfaces At the same time, it ensures good surface processing quality, small workpiece subsurface damage and high processing efficiency, so as to meet the processing requirements of modern optics for optical parts. The deterministic magnetorheological polishing technology uses the rheology of the magnetorheological polishing fluid in the magnetic field to polish the workpiece. The magnetorheological polishin...

Claims

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Application Information

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IPC IPC(8): B24B57/02B24B13/00
Inventor 戴一帆李圣怡彭小强石峰宋辞陈浩锋刘晓东
Owner NAT UNIV OF DEFENSE TECH
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