Manufacturing method for floating type micro-silicon electrostatic gyro/accelerometer sensitive structure

A technology of accelerometer and sensitive structure, which is applied in the manufacture of microstructure devices, velocity/acceleration/impact measurement, microstructure technology, etc. It can solve the problems of prototypes without forming principles and achieve easy-to-achieve effects

Inactive Publication Date: 2008-10-08
TSINGHUA UNIV +1
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  • Abstract
  • Description
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Problems solved by technology

At present, the technology of the suspension head is in the stage of experimental exploration, and there is no report on the prototype of the formation principle.

Method used

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  • Manufacturing method for floating type micro-silicon electrostatic gyro/accelerometer sensitive structure
  • Manufacturing method for floating type micro-silicon electrostatic gyro/accelerometer sensitive structure
  • Manufacturing method for floating type micro-silicon electrostatic gyro/accelerometer sensitive structure

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Embodiment Construction

[0038] The specific embodiments of the present invention will be further described below in conjunction with the accompanying drawings.

[0039] Using this process has successfully flowed out the die, such as figure 1 As shown, the planar size of the die is on the order of millimeters, and the thickness is on the order of microns, and the die is packaged with a CQFP, DIP or PLCC shell. This sensitive structure process requires 8 reticles, and Table 1 describes the definition of reticles in detail.

[0040] Table 1 Definition of the mask required for the process

[0041]

[0042] Image 6 It is a schematic diagram of the process flow of the present invention. In conjunction with the mask plate required for the process in Table 1, the present invention is described as follows:

[0043] 1. Glass etching process and gold sputtering process; standard cleaning of glass, coating of photoresist and photolithography of bottom and top glass according to meml-1 and meml-2 masks, ...

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Abstract

The invention relates to a method for preparing a levitation-type micro-silicon electrostatic gyro/ accelerometer sensitive structure, which belongs to the technical field of silicon structure processing. The method comprises the steps: glass etching; glass gold splashing: a metal layer raising 400-600 tenthmeters higher than a glass surface; perforating the glass; a first and a second RIE etching for the silicon slice; film beam process: high-temperature dry oxidation and surface corrosion; a first electrostatic bonding for glass and silicon; thinning and polishing to the silicon slice; ICP etching for the silicon slice; a third RIE etching for the silicon slice; a fourth RIE etching for the silicon slice; a second electrostatic bonding for glass and silicon; ICP removal for film beam to prepare the levitation-type micro-silicon electrostatic gyro/ accelerometer sensitive structure. The method adopts the proposal of sandblasting perforating for perforating the glass, introduces the silicon dioxide film beam as a sacrificial layer and adopts the ICP film beam removal process; the method can effectively solve the problem of adherence of a sandwich microstructure in the second electrostatic bonding and does not need post treatment so that the method has higher efficiency and better compatibility with the MEMS process.

Description

technical field [0001] The invention relates to a processing method for a sensitive structure of a MEMS inertial instrument, and belongs to the technical field of micro-silicon structure processing. Background technique [0002] There have been many researches on electrostatic levitation technology abroad, which are mainly used in military and civilian fields such as inertial navigation, scientific experiments in the space field, and microgravity measurement. The structure of the electrostatic levitation micro-gyroscope / accelerometer borrows from the glass-silicon-glass "sandwich" structure in previous MEMS devices. The suspension principle borrows from the electrostatic gyroscope and electrostatic accelerometer that relied on precision machining in the past, and the rotation principle borrows from the variable capacitance principle of the micro-motor. Electrostatic force has been widely used in micro-mechanics. The successful development of electrostatic micro-motor shows ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00G01P15/00G01P15/02
Inventor 董景新吴黎明徐永青韩丰田刘云峰罗蓉万蔡辛
Owner TSINGHUA UNIV
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