Process for preparing patterned cellulosic by micro-fluidic chip

A microfluidic chip, patterned technology, applied in microorganism-based methods, biochemical equipment and methods, microorganisms, etc., can solve problems such as not yet retrieved

Inactive Publication Date: 2008-10-15
HUAZHONG UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The present invention provides a new technology for orderly and regular assembly of bacterial cellulose. Since this technology is an original achievement, no relevant domestic patent applications and authorizations have been retrieved yet.

Method used

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  • Process for preparing patterned cellulosic by micro-fluidic chip
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  • Process for preparing patterned cellulosic by micro-fluidic chip

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] (1) Preparation of patterned positive film: preparation such as figure 2 For the photomask shown, uniformly coat a layer of photoresist SU8-GM1070 on the 2-stage polished silicon wafer with a glue throwing machine. The rotation speed of the glue throwing machine is set as: 500r / min, 30S; 1700r / min , 48S. A photoresist coating with a depth of 50 μm was thus obtained on the silicon wafer. The silicon wafer is pre-baked (first at 65°C for 15 minutes, then at 95°C for 2 hours), exposed to UV light for 85 seconds, post-baked (first at 65°C for 15 minutes, then at 95°C for 40 minutes), and developed with PGMEA for 2 minutes. Harden the film at 135°C for 2 hours to obtain patterned as figure 2 The positive membrane is shown. The anodic film pattern consists of thick and thin stripes, the thick stripe width a is 40 microns, the thin stripe width b is 20 microns, the stripe spacing c is 2 mm, and the stripe length d is 2 cm.

[0027] (2) Preparation of PDMS module: Stir th...

Embodiment 2

[0036](1) Preparation of patterned positive film: uniformly coat a layer of photoresist SU8-GM1070 on the 2-stage polished silicon wafer with a glue throwing machine, and set the rotation speed of the glue throwing machine as: 500r / min, 30S; 5000r / min, 48S. A photoresist coating with a depth of 15 μm was thus obtained on the silicon wafer. The silicon wafer is pre-baked (first at 65°C for 15 minutes, then at 95°C for 35 minutes), exposed to ultraviolet light for 35 seconds, post-baked (first at 65°C for 15 minutes, then at 95°C for 40 minutes), and developed with PGMEA for 25 seconds. After hardening the film at 135°C for 2 hours, the following Figure 4 The patterned positive film shown: the stripe width L1 is 20 μm, and the stripe spacing L2 is 40 μm.

[0037] (2) Preparation of PDMS module: Stir the mixture of Sylgard 184 silicone elastomer base and Sylgard184 silicone elastomer curing agent (5:1w / w) to vacuumize, pour it on the surface of the anodic membrane (thickness i...

Embodiment 3

[0046] (1) Preparation of patterned positive film: preparation such as Figure 6 For the photomask shown, uniformly coat a layer of photoresist SU8-GM1070 on the 2-stage polished silicon wafer with a glue throwing machine, and the rotation speed of the glue throwing machine is set as: 500r / min, 30S; 900r / min , 48S. A photoresist coating with a depth of 100 μm was thus obtained on the silicon wafer. The silicon wafer is pre-baked (first at 65°C for 15 minutes, then at 95°C for 2 hours), exposed to ultraviolet light for 100 seconds, post-baked (first at 65°C for 15 minutes, then at 95°C for 40 minutes), and developed with PGMEA for 7 minutes. Harden the film at 135°C for 2 hours to obtain Figure 6 The patterned positive film shown: the stripe width L1 is 50 μm, and the stripe spacing L2 is 200 μm.

[0047] (2) Preparation of PDMS module: Stir the mixture of Sylgard 184 silicone elastomer base and Sylgard184 silicone elastomer curing agent (10:1w / w) to vacuumize, pour it onto...

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Abstract

The invention provides a method for preparing patterning cellulose through a micro-fluidic chip. The method comprises the following: (1) a step of making an anode membrane according to a preset pattern; (2) a step of preparing a polydimethyl siloxane (PDMS) module matched with the anode membrane pattern; (3) perforating the PDMS module, and pressing a clean carrier piece tightly onto the surface of the PDMS module having the pattern to form the micro-fluidic chip, wherein the patterning duct on the PDMS module being communicated with the outside through holes; (4) a step of filling two fluid bathes with inoculum, making the patterning duct on the micro-fluidic chip respectively communicated with the two fluid bathes through vessels, regulating the liquid level difference between the two fluid bathes to control the flowing velocity of the liquid in the patterning duct, culturing for 5 to 20 days with the liquid level difference of 1 to 20 cm, and disclosing the PDMS module to obtain the patterning cellulose. The bacteria cellulose material produced through the method has microscopic orderliness and macroscopic pattern nature with biocompatibility and ecological compatibility accompanied, thereby being ideal environmental friendly material.

Description

technical field [0001] The invention belongs to the technical field of macromolecular materials and biomanufacturing, and in particular relates to a method for preparing patterned cellulose materials. Background technique [0002] Cellulose is the most abundant and biodegradable natural polymer in nature, and will become one of the main chemical raw materials in the future. Bacterial cellulose fibers have many unique properties. In addition to the basic characteristics of high purity, high crystallinity, and high degree of polymerization, it is also the finest nanofiber in nature. It is composed of multi-level microfibers to form an intertwined and developed ultra-fine network structure; the "nano effect" makes It has the characteristics of high water absorption, high water retention, high permeability to liquid and gas, high wet strength, especially in-situ processing and molding in wet state. Excellent comprehensive properties make bacterial cellulose fibers widely used ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C12P19/04G03F7/00B82B3/00C12R1/01
Inventor 杨光王刚刘笔锋史续典陈旭峰
Owner HUAZHONG UNIV OF SCI & TECH
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