Device for increasing utilization ratio of high vacuum ion beam sputter target

Abstract

The invention relates to a device for improving utilization rate of a high vacuum ion beam sputtering target material. The device is arranged at a lateral part of a vacuum filming chamber, and is arranged outside the vacuum filming chamber except the target position. The target position is connected with a bidirectional rotating component driven by a stepper motor so as to realize precise bidirectional rotation. The bidirectional rotating component is also connected with an axial reciprocating component driven by another stepper motor so as to realize precise axial reciprocating displacement of the target position. The two sets of stepper motors are connected in electrical control with the electrical pulse signal output end of an PLC programmable controller. The device is capable of improving the utilization rate of the target material by 60 percent to 100 percent. Multicomponent cladding type complex film and synthetic film products both having excellent quality can be obtained through an embedded type flat target. The cost of processing products and maintaining equipment is largely reduced, the utilization rate of the volume of the vacuum chamber can be improved, and energy is saved.

Description

technical field [0001] The invention relates to a high vacuum sputtering equipment, in particular to an improved high vacuum ion beam sputtering target utilization rate enhancing device. Background technique [0002] Sputtering clad composite film products with special functions in a high vacuum environment requires specific sputtering methods, such as ion beam sputtering technology: accurate and controllable ion / atom arrival ratio can be obtained at low temperature (<200°C) , It is easy to obtain a variety of synthetic films with different components and structures, has good binding force to all substrates, and effectively controls the size and distribution of ultrafine particles. However, due to the high energy density of the ion beam focused beam spot, it is difficult to accurately control the ion / atom arrival ratio of the mosaic target, which affects the composition and structure control of the coated composite film and the synthesized film; in addition, the ion beam ...

AI Technical Summary

Problems solved by technology

However, due to the high energy density of the ion beam focused beam spot, it is difficult to accurately control the ion / atom arrival ratio of the mosaic target, which affects the composition and structure control of the coated composite film and the synthesized film; in addition, the ion beam focused beam spot The sputtering of the fixed part of the target will shorten the service life of the target and reduce the utilization rate of the target, especially for precious metal targets and difficult-to-process targets, it will greatly increase the cost of its coated composite film products. Cost of production

The currently disclosed "sputtering target" with patent No. 99243973.6 uses a curved cross-sectional shape of the sputtering target, which is close to the actual consumption curve of the target and can increase the utilization rate of the target by 40-80%. , but as the composition of the target changes, the actual consumption curve of the target will also change significantly, making the processing technology of the curved sputtering target more complex and increasing the processing difficulty and cost

Images