Silicon wet method corrosion for manufacturing multiple stage micro-reflector

Abstract

The invention relates to a method using silicon wet etching to produce a multi-stage microreflecting mirror, which comprises the following steps that: a silicon chip, the upper surface of which has certain angle with a (111) surface, is selected as a material of the multi-stage microreflecting mirror, and the upper surface of the silicon chip is polished; a layer of masking material grows on the surface of the silicon chip; a bar masking film pattern is formed on the upper surface of the silicon chip; the surface uncovered by the masking film undergoes anisotropic etching to obtain a staircase structure; and the surface of the staircase structure is coated with a reflection increasing film to obtain the multi-stage microreflecting mirror. One-time photoetching is adopted to obtain the masking film pattern and the particularity of the (111) surface of the silicon chip in the anisotropic etching technology is utilized to obtain a reflecting plane and a sectional surface of the multi-stage microreflecting mirror, so the method has small lateral dimension error during the production, can more accurately control the etching depth, and effective improve the longitudinal dimension accuracy and the repetitiveness of the staircase. The method has simple process and less process steps, and contributes to the improvement of production efficiency.

Description

technical field [0001] The invention relates to a method for manufacturing a multistage microreflector, in particular to a method for manufacturing a multistage microreflector by silicon wet etching. Background technique [0002] As a light reflection device, multistage micromirrors are widely used in optical systems, such as spectral analysis, beam shaping and fiber coupling. [0003] With the development of optical systems toward small size and compact structure, the miniaturization of devices in optical systems has become an important research topic for optical devices. The design and fabrication level of micro-optical devices directly determines the performance of optical instruments. Multi-level micro-mirrors can prepare step microstructures on various materials such as quartz by multiple photolithography and multiple etching (dry or wet) on the substrate by binary optical technology. This method has the following disadvantages: 1. Due to multiple overlays, the horizon...

AI Technical Summary

Problems solved by technology

Multi-level micro-mirrors can prepare step microstructures on various materials such as quartz by multiple photolithography and multiple etching (dry or wet) on the substrate by binary optical technology. This method has the following disadvantages: 1. Due to multiple overlays, the horizontal accuracy is difficult to guarantee; 2. It is difficult to accurately control the corrosion or etching depth, and the accuracy and repeatability are poor

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