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Method for preparing Ni/Si nano-wire array and micro-nano humidity sensor based on the nano-wire array

A technology of nanowire array and humidity sensor, which is applied in chemical instruments and methods, manufacturing microstructure devices, microstructure technology, etc., to achieve the effects of easy realization, low cost and simple technology

Inactive Publication Date: 2010-09-01
EAST CHINA NORMAL UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Although the technology of electroless deposition of metal thin films on large substrates has been extensively studied, the technology of fabricating silicon nanowires by electrochemical wet etching and preparing humidity sensors by electroless deposition of nickel thin films on its surface is not yet available. Few literature reports

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  • Method for preparing Ni/Si nano-wire array and micro-nano humidity sensor based on the nano-wire array
  • Method for preparing Ni/Si nano-wire array and micro-nano humidity sensor based on the nano-wire array
  • Method for preparing Ni/Si nano-wire array and micro-nano humidity sensor based on the nano-wire array

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Embodiment Construction

[0029] The technical characteristics of the present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0030] 1. Preparation of large-area silicon nanowires:

[0031] Cut N-type silicon (resistivity about 10-50Ω·cm) into 1cm×1.5cm fragments as the substrate, and adopt electrochemical wet etching technology, in AgNO 3 Silver solution 30mmol / L (as a catalyst): 20% hydrofluoric acid solution: deionized water = 1:1:1 (volume ratio) etching solution at room temperature for 30min. The etched silicon nanowire array SEM photo is shown in Figure 1; Figure 1a We can see that the upright silicon nanowires are evenly distributed, with local agglomeration, Figure 1b It can be seen that the porosity of the nanowire array is relatively uniform, and there is a large discontinuous area in the middle of the locally agglomerated array, Figure 1c It shows that the height of the nanowire array is about 100 μm, and it has a large...

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Abstract

The invention discloses a method for preparing a Ni / Si nano line array and a micro-nano humidity sensor based on the nano line array. The sensor is to adopt the electrochemical etching technology to manufacture the large-area silicon nano line array on an N-type silicon substrate and then to settle a nickel film without electroplating on the array. Because the structure has large slenderness ratio and specific surface area, the microstructure of the Ni / Si nano line array is unique and can generate unique physical and chemical properties, and the absorption capacity and the desorption capacityof the Ni / Si nano line array on water molecules are better than those of a pure silicon nano line array. After rapid thermal annealing (RTA) treatment at a temperature of 500 DEG C, the surface resistivity of the sensor is increased and the hygronasty of a capacitor is strengthened. The method has simple technique which is compatible with the integrated circuit technique; and the sensor can perform mass production and has low manufacturing cost and wide application prospect.

Description

technical field [0001] The invention relates to a method for preparing a Ni / Si nanowire array and a micro-nano humidity sensor based on the nanowire array. Specifically, it is a method for preparing a micro-nano humidity sensor by constructing a Ni / Si nano-composite structure by electroless nickel plating on a silicon nanowire array, and belongs to the technical field of micro-nano sensor production. technical background [0002] Humidity measurement is a technology that is closely related to our lives. It has a wide range of applications. For example, we can analyze the relative humidity of our environment, the growth of crops, and the freshness of our food based on the measurement results of humidity. , and humidity sensors have been used in clinical and biological applications. Due to the characteristics of small scale and large specific surface area, nanomaterials are widely used in electrical, optical, magnetic properties, mechanics and chemistry. With the continuous ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B81C1/00C01B33/021
Inventor 陶佰睿苗凤娟李辉麟万丽娟张健
Owner EAST CHINA NORMAL UNIV