Method for preparing pixel structure

Abstract

The invention provides a method for manufacturing a pixel structure. The method comprises the following steps: firstly, a grid is formed on a base plate. Then a grid insulation layer is formed on a base plate so as to cover the grid; in addition, a channel layer, a source electrode and a drain electrode are formed on the grid insulation layer on the grid simultaneously, wherein, the grid, the channel layer, the source electrode and the drain electrode compose a thin film transistor. A protection layer is formed on the thin film transistor and the grid insulation layer; a black matrix is formed on the protection layer, wherein, the black matrix is provided with a contact opening above the drain electrode and a color filtering layer holding opening. Then a color filtering layer is formed inthe color filtering layer holding opening by an ink-jet printing process; a dielectric layer is formed on the black matrix and the color filtering layer. Then the dielectric layer and the protection layer are patterned so as to expose the drain electrode. Then a pixel electrode electrically connected with the drain electrode is formed.

Description

technical field [0001] The present invention relates to a method for fabricating a pixel structure, and more particularly to a method for fabricating a pixel structure with a color filter layer using less photolithography and etching process (PEP). Background technique [0002] Liquid crystal displays have the advantages of high image quality, small size, light weight, low voltage drive, low power consumption, and wide application range. Therefore, they have replaced cathode ray tubes (Cathode Ray Tube, CRT) and become the mainstream of the new generation of displays. A traditional liquid crystal display panel is composed of a color filter substrate with a color filter layer, a thin film transistor array substrate (TFT Array Substrate), and a liquid crystal layer arranged between the two substrates. In order to improve the resolution of the panel and the aperture ratio of the pixels, and to avoid alignment errors when the color filter substrate and the TFT array substrate ar...

AI Technical Summary

Problems solved by technology

[0007] Based on the above, the known method of fabricating the color filter layer on the thin film transistor array requires at least seven photolithography and etching processes, and the steps are complicated and require high production costs.

In addition, the above-mentioned pixel structure requiring at least seven photolithography and etching processes needs to use multiple masks with different patterns. Since the mask is very expensive, the manufacturing cost of the pixel structure will not be reduced.

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