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Method for preparing ALON protection film for optical element

A technology for optical components and protective films, applied in the field of preparation of AlON protective films for optical components, can solve the problems of opaque application range, large absorption, and large stress in the visible light band, and achieve high transmittance, low absorption coefficient, and mechanical strength. high effect

Inactive Publication Date: 2009-01-21
GENERAL RESEARCH INSTITUTE FOR NONFERROUS METALS BEIJNG +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

DLC, Ge 1-x C x Film is a commonly used protective film for optical components, but its application range is limited due to its own shortcomings such as large stress, large absorption, and opacity in the visible light band.

Method used

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  • Method for preparing ALON protection film for optical element

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] (1) Install the equipment according to the above steps, the optical element substrate 10 is placed on the substrate stage 8, the material of the optical element substrate 10 is KCl, and the vacuum chamber 4 is first vacuumed to be higher than 3 * 10 -3 Pa, then adopt resistive heating mode, the optical element substrate 10 is heated to 200C;

[0024] (2) Fill the vacuum chamber 4 with Ar gas, keep the vacuum at 0.2Pa, adopt the radio frequency magnetron sputtering process, sputtering power 300W, and bombard and clean the surface of the Al target 3 for 10 minutes;

[0025] (3) Press N 2 / (N 2 +O 2 )=0.5, (N 2 +O 2 ) / Ar=0.2 ratio into Ar, N 2 Gas and O 2 Gas mixed gas, working vacuum 0.2Pa, adopt radio frequency magnetron sputtering process, keep sputtering power 100W, control deposition rate and deposition time, plate 100nm thick plate type AlON protective film 1 on both sides of optical substrate 10;

[0026] (4) After the deposition is completed, the temperature...

Embodiment 2

[0030] (1) Install the equipment according to the above steps, the optical element substrate 10 is placed on the substrate table 8, the material of the optical element substrate 10 is ZnSe, first the vacuum chamber 4 is evacuated to be higher than 3 * 10 -3 Pa, then adopt resistance heating mode, the optical element substrate 10 is heated to 500C;

[0031] (2) Fill the vacuum chamber 4 with Ar gas, keep the vacuum at 0.3Pa, adopt the radio frequency magnetron sputtering process, sputtering power 100W, and bombard and clean the surface of the Al target 3 for 10 minutes;

[0032] (3) Press N 2 / (N 2 +O 2 )=0.6, (N 2 +O 2 ) / Ar=0.2 ratio into Ar, N 2 Gas and O 2 Gas mixed gas, working vacuum 0.2Pa, adopt radio frequency magnetron sputtering process, keep sputtering power 200W, control deposition rate and deposition time, coat 800nm ​​thick spherical crown type AlON protective film 1 on both sides of optical substrate 10;

[0033] (4) After the deposition is completed, the t...

Embodiment 3

[0037] (1) Install the equipment according to the above steps, the optical element substrate 10 is placed on the substrate table 8, the material of the optical element substrate 10 is Ge, and the vacuum chamber 4 is first vacuumed to be higher than 3 × 10 -3 Pa, then adopt resistive heating mode, the optical element substrate 10 is heated to 400C;

[0038] (2) Fill the vacuum chamber 4 with Ar gas, keep the vacuum at 0.1Pa, adopt DC magnetron sputtering process, sputtering power 500W, and bombard and clean the surface of the Al target 3 for 8 minutes;

[0039] (3) Press N 2 / (N 2 +O 2 )=0.2, (N 2 +O 2 ) / Ar=0.3 ratio into Ar, N 2 Gas and O 2 Gas mixed gas, working vacuum 0.2Pa, adopting DC magnetron sputtering process, keeping sputtering power 50W, controlling deposition rate and deposition time, coating 80nm thick flat AlON protective film 1 on both sides of optical substrate 10;

[0040](4) After the deposition is completed, the temperature of the workpiece is slowly l...

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Abstract

The invention relates to a preparation method of AION protective films for optical elements, belonging to the film preparation technical field, which uses high-purity metal AI as target, Ar gas as working gas, N2 and O2 gas as reaction gas, uses reaction magnetic control splash technique to prepare AION films. The AION film has high transmittance and low absorption factor in wide waveband of 0.2 to 12um, high mechanical strength, rigidity, abrasion resistance, high chemical stability and corrosion resistance, which is suitable for the use as rigid protective film of military optical windows and the uses as moisture proof protective film and abrasion resistant film for general optical elements as prisms and lens.

Description

technical field [0001] The invention belongs to the technical field of film preparation, and in particular relates to a preparation method of an AlON protective film for an optical element. Background technique [0002] ZnSe, ZnS, Ge and other materials have low hardness, so the optical components made of these materials are easily damaged in the working environment and affect normal work, while prisms and windows made of KCl plasma crystals are easily deliquescent in the atmosphere , so it is necessary to coat the surface with a protective film to ensure normal use. [0003] An ideal optical protective film should not only have optical properties such as visible, near-infrared, mid-infrared, and far-infrared multi-band transparency and small absorption coefficient, but also have high mechanical strength, high hardness, wear resistance, good chemical stability, and Corrosion and other characteristics. DLC, Ge 1-x C x Film is a commonly used protective film for optical co...

Claims

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Application Information

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IPC IPC(8): G02B1/10C23C14/34C23C14/35G02B1/14
Inventor 张树玉苏小平杨海黎建明刘伟闫兰琴刘嘉禾
Owner GENERAL RESEARCH INSTITUTE FOR NONFERROUS METALS BEIJNG
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