Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Photosensitive composition, photosensitive resin transfer film, and method for producing a photospacer, and substrate for a liquid crystal display device and liquid display device

A photosensitive resin and composition technology, applied in optics, optomechanical equipment, nonlinear optics, etc., can solve problems such as inability to maintain the uniformity of the liquid crystal layer, image inhomogeneity, large plastic deformation, etc., and achieve the elimination of display inhomogeneity , high quality image, high deformation recovery effect

Inactive Publication Date: 2009-01-28
FUJIFILM CORP
View PDF20 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] When forming a panel, optical spacers formed by subjecting a photosensitive composition to patterning, alkaline development, and baking tend to have poor compressive strength at spacer points and large plastic deformation
In order to display high-quality images, it is necessary to avoid the problems caused by these tendencies, that is, the problem that the uniformity of the liquid crystal layer cannot be maintained due to the thickness of the liquid crystal layer being smaller than its design value, and image unevenness etc.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photosensitive composition, photosensitive resin transfer film, and method for producing a photospacer, and substrate for a liquid crystal display device and liquid display device
  • Photosensitive composition, photosensitive resin transfer film, and method for producing a photospacer, and substrate for a liquid crystal display device and liquid display device
  • Photosensitive composition, photosensitive resin transfer film, and method for producing a photospacer, and substrate for a liquid crystal display device and liquid display device

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0032] The photosensitive resin layer is subjected to a preparation process described in detail later, so as to form an optical spacer with excellent deformation recovery ability and can maintain a uniform thickness of the element. By using the optical spacers, display unevenness in images is effectively prevented, particularly in a display device in which display unevenness is easily caused by fluctuations in element thickness.

[0033] Examples of methods for forming a photosensitive resin layer on a support include: (a) by a known coating method, a method of applying a solution including the photosensitive composition of the present invention, and (b) laminating by a transfer printing method Photosensitive resin transfer film method. Each method will be described in detail below.

[0034] (a) Coating method

[0035] The photosensitive composition can be applied by known methods such as spin coating, curtain coating, slot coating, dip coating, air knife coating, roll coati...

Embodiment 1

[0204] 2.45 parts of 1-methoxy-2-propanol (trade name: MFG, manufactured by Nippon Nyukazai Co., Ltd.) was placed in the reaction vessel, followed by heating to 90°C. Into a reaction vessel at 90° C., under a nitrogen atmosphere, 2.07 parts of MMDOL 30 (trade name, manufactured by Osaka Organic Chemical Industry Ltd.), 1.20 parts of methacrylic acid, 0.22 parts of dimethicone were added dropwise over 2 hours. Nitrogen polymerization initiator (trade name: V-601, manufactured by Wako Pure Chemical Industries, Ltd.) and a mixed solution consisting of 2.07 parts and 1-methoxy-2-propanol. After the addition, the components were reacted, whereby an acrylic resin solution was obtained.

[0205] Next, to the acrylic resin solution, 0.0068 parts of hydroquinone monomethyl ether and 0.02 parts of tetraethylammonium bromide were added, and then 1.23 parts of glycidyl methacrylate was added dropwise to the join in it. After being added by dropwise addition, the components were reacted ...

Embodiment 2

[0210] In Synthesis Example 2, the synthesis of the resin (A) represented by the compound structure P-2 will be described.

[0211] In the same manner as in Synthesis Example 1, a solution of the resin represented by the compound structure P-2 having an unsaturated group (45% solution in 1-methoxy-2-propanol, solid content acid value: 52.1mg KOH / g, Mw: 15,000), the difference is: MEDOL 30 (trade name, manufactured by Osaka Organic Chemical Industry Ltd.), methacrylic acid and glycidyl methacrylate were added to The ratio x:y:z in compound structure P-2 was set to 47.5 mol%:18.2 mol%:34.3 mol% instead of adding MMDOL 30, methacrylic acid and glycidyl methacrylate in Synthesis Example 1.

[0212] The obtained resin (A) specifically has a structure represented by compound structure P-2, wherein R X is methyl, R Y is methyl, and R Z For methyl.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle sizeaaaaaaaaaa
thicknessaaaaaaaaaa
glass transition temperatureaaaaaaaaaa
Login to View More

Abstract

The invention provides: a photosensitive composition which has a high deformation restorability and may eliminate display unevenness in a liquid crystal display device, a photosensitive resin transfer film and a method for producing a photospacer using the composition or the film; and a liquid crystal display device substrate and a liquid crystal display device which may eliminate display unevenness and thus display high quality images. The photosensitive composition includes: a resin (A) including a group having a cyclic structure including two or more heteroatoms in a side chain, a group having an acidic group in a side chain, and a group having an ethylenically unsaturated group in a side chain; a polymerizable compound (B); and a photopolymerization initiator (C).

Description

technical field [0001] The present invention relates to a photosensitive composition and a photosensitive resin transfer film suitable for producing a spacer usable for a display device in which fluctuations in the cell thickness of a liquid crystal cell tend to cause display unevenness and relates to a method for preparing optical spacers. The present invention also relates to a substrate for a liquid crystal display device (a liquid crystal display device substrate) and a liquid crystal display device, each of which has the optical spacer produced by the method. Background technique [0002] Heretofore, liquid crystal display devices have been widely used for display devices that display high-quality images. In a liquid crystal display device, a liquid crystal layer capable of displaying an image is generally disposed between a pair of substrates according to a predetermined orientation. Maintenance of a uniform distance between the substrates, that is, maintenance of a ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/028G03F7/11G03F7/00G02F1/1333
CPCG03F7/033G03F7/0388G03F7/027G03F7/028
Inventor 中村秀之望月乔平福重裕一有冈大辅
Owner FUJIFILM CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products