Charge trapping memory cell with high speed erase
Patent Information
- Authority / Receiving Office
- CN Β· China
- Current Assignee / Owner
- MACRONIX INT CO LTD
- Publication Date
- 2009-02-18
- Estimated Expiration
- Not applicable Β· inactive patent
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Abstract
Description
technical field
[0001] The present invention relates to flash memory technology, and more particularly to a scalable charge trapping memory technology suitable for high speed erase and program operations. Background technique
[0002] Flash memory (flash memory) is a type of non-volatile integrated circuit memory technology. Traditional flash memory uses floating gate memory cells. As the integration level of memory devices increases, the floating gate memory cells become closer together, making mutual interference of charges stored in adjacent floating gates gradually becoming a problem. Therefore, the ability to increase the integration level of the flash memory based on the floating gate memory cell is limited. Another type of memory cell used in flash memory is a charge trapping memory cell that utilizes a dielectric charge trapping layer instead of a floating gate. The charge-trapping memory cell uses a dielectric charge-trapping material, which does not cause interfe...