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Novel electrode box

An electrode box and electrode plate technology, which is applied in the field of electrode boxes, can solve the problems of great influence on product quality, high requirements on cleanliness, and difficulty in improving product quality by electrode box structure, so as to achieve stable and reliable electrical contact and ensure the effect of durability.

Active Publication Date: 2010-10-06
上海曙海太阳能有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The existing electrode box for preparing glass coating materials is usually a vertical electrode box. The substrate of the coating material is a glass substrate. The glass substrate is loaded on the electrode plate and the coating is completed in the vacuum chamber with the participation of various gases. and humidity have a great influence on the quality of the product produced, therefore, in the product cost, the manufacturing cost and operating cost of the electrode box account for a large proportion
[0005] The disadvantages of the existing technology are: due to the high cleanliness requirements of the production environment of the product, the existing electrode box structure is difficult to improve product quality and produce high-end products

Method used

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Embodiment Construction

[0028] Below in conjunction with accompanying drawing, the implementation of technical scheme is described in further detail:

[0029] see figure 1 A schematic diagram of the novel electrode cartridge is shown.

[0030] The invention relates to a new type of electrode box. The upper part of the electrode box is provided with an air inlet, and the lower part is provided with an exhaust port. The air inlet communicates with the inner cavity of the electrode box through a uniform gas plate provided with a matrix of air inlet holes to ensure The gas evenly enters the inner cavity of the electrode box, and then evenly enters each pair of electrodes, so that the gas is uniform in the length direction of the entire glass.

[0031] The exhaust port communicates with the inner cavity of the electrode box through the base plate with a matrix of gas outlet holes to ensure that the gas is evenly discharged from the inner cavity of the electrode box and that the gas is evenly distributed ...

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Abstract

The invention relates to a novel electrode box which is used in a vacuum film coating machine. The upper part of the electrode box is provided with an air inlet, and the lower part is provided with a vent; the air inlet is communicated with the inner cavity of the electrode box by an even air plate with a small air inlet matrix; the vent is communicated with the inner cavity of the electrode box by a base plate with a small air outlet matrix; the inner cavity of the electrode box comprises a plurality of electrode plates; the upper end of each electrode plate is vertically connected with the even air plate, and the lower end of each electrode plate is vertically connected with the base plate; the electrode box is characterized in that the electrode box further comprises auxiliary heat isolating plates arranged between the even air plate and the base plate and in parallel with the electrode plates; the auxiliary heat isolating plates are respectively arranged on both sides of the electrode plates; the even air plate, the auxiliary heat isolating plates and the base plate enclose a framework. The glass base plates of the coated film are arranged in parallel and cover two main placesof all the electrode plates. The electrode box greatly improves the quality of the film deposited on the glass base plates.

Description

technical field [0001] The invention relates to electronic equipment and solar cell technology, in particular to an electrode box used in a vacuum coating machine. Background technique [0002] Amorphous silicon solar cell is a new solar cell technology newly developed in the world for more than 20 years. The silicon material thickness of amorphous silicon thin-film solar cells is only about 1 micron, which is 1 / 200-1 / 300 of the silicon material thickness of monocrystalline silicon solar cells. The film growth time is short, the equipment is simple to manufacture, and it is easy to produce in large quantities. According to the estimates of relevant international experts, amorphous silicon thin film solar cells are the most promising solar cells that can greatly reduce costs. [0003] In the prior art, plasma chemical vapor deposition vacuum equipment used for large-scale manufacturing of photovoltaic modules includes main components such as a vacuum chamber and an electrode...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/44C23C16/513H01L31/20H01L21/203
CPCY02P70/50
Inventor 奚建平金小亮李茂程
Owner 上海曙海太阳能有限公司
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