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Omnidirectional ion injection and deposition batch composite handling arrangement and method

A technology of ion implantation and compound treatment, which is applied in the direction of ion implantation plating, coating, metal material coating process, etc., can solve the problems of no significant improvement in wear resistance and corrosion resistance and low efficiency, and achieve improvement and resistance Corrosion ability, wide range of application fields, effect of improving efficiency

Inactive Publication Date: 2009-04-29
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to solve the low efficiency of the single processing parts of the existing surface strengthening treatment device, can not carry out batch strengthening treatment to the surface of mechanical parts and the method of existing surface strengthening treatment does not carry out composite treatment to the mechanical parts, the surface of the mechanical parts There is no significant improvement in its wear resistance and corrosion resistance after strengthening treatment, and then a comprehensive ion implantation and deposition batch composite processing device and method are provided.

Method used

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  • Omnidirectional ion injection and deposition batch composite handling arrangement and method
  • Omnidirectional ion injection and deposition batch composite handling arrangement and method
  • Omnidirectional ion injection and deposition batch composite handling arrangement and method

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specific Embodiment approach 1

[0006] Specific implementation manner one: such as Figure 1~3 As shown, the omnidirectional ion implantation and deposition batch composite processing device described in this embodiment consists of a vacuum chamber body I, two sets of pulsed cathode arc sources II, two sets of magnetron sputtering targets III, a radio frequency interface assembly IV, and a central rotation The target stage system V is composed of the vacuum chamber body I consisting of a cylinder body 1, a cylinder upper end cover 2 and a cylinder lower end cover 3. The cylinder upper end cover 2 and the cylinder lower end cover 3 are respectively connected to the cylinder body 1 The upper and lower end surfaces of the two sets of pulsed cathode arc sources II are arranged symmetrically along the axis of the cylindrical body 1 on the outer side wall of the cylindrical body 1 and communicate with the cylindrical body 1. The two sets of magnetron sputtering The target III is symmetrically arranged on the outer side...

specific Embodiment approach 2

[0007] Specific implementation manner two: such as image 3 As shown, the number of the plurality of gear shafts 5 and the plurality of gears 7 in this embodiment is twenty-four. Several gear shafts 5 and several gears 7 are used to ensure a single batch processing of the surface of mechanical parts. Other components and connection relationships are the same as in the first embodiment.

specific Embodiment approach 3

[0008] Specific implementation manner three: such as figure 1 , figure 2 As shown, the workpiece rotating device (4), two sets of pulsed cathode arc sources (II) and two sets of magnetron sputtering targets (III) in this embodiment are arranged on the same horizontal plane. Ensure the axial uniformity of the strengthening layer on the surface of the mechanical parts. Other components and connection relationships are the same as in the first embodiment.

[0009] Specific implementation manner 4: such as image 3 As shown, the central rotating target stage system V of this embodiment further includes a shaft sleeve 15. The lower end surface of the shaft sleeve 15 is fixedly mounted on the upper end surface of the cylindrical lower end cover 3, and the shaft sleeve 15 is sleeved on the rotation shaft. On 14, the stability of the rotation shaft 14 is enhanced. Other components and connection relationships are the same as in the first embodiment.

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Abstract

The invention relates to a device and a method for the batch composite processing of omnidirectional ion implantation and deposition, which aim at the problems that the prior device and the prior method for the batch composite processing of the omnidirectional ion implantation and deposition have low efficiency in processing parts, and the parts after the processing has poor wear resistance and poor corrosion resistance. The central rotating target platform system of the device is arranged on a lower end cover of a cylinder; and a workpiece rotating device is arranged above the central rotating target platform system and consists of a disk target platform, a plurality of gear shafts and a plurality of gears. The method for the batch composite processing comprises the following steps: a. vacuum treatment; b. adopting a pulse bias of which the high pressure amplitude is between 20 and 40 kilovolts to achieve Ti ion implantation; c. TiN deposition; d. MoS2 deposition; and e. Ti deposition. The device improves the number of the parts processed at a single time; and the method improves the wear resistance and the corrosion resistance of the parts.

Description

Technical field [0001] The invention relates to a surface strengthening treatment device and a method for using the device to perform surface strengthening treatment on the surface of a mechanical part. Background technique [0002] The corrosion and abrasion of the surface of industrial parts are the main forms of part failure. In order to prolong the service life of the parts, the surface modification treatment of the workpiece is generally carried out. Surface coating, beam line ion implantation and ion beam assisted deposition are commonly used techniques in the field of material surface modification. The modified layer obtained by the surface coating technology is easy to fall off, and the beam line ion implantation and ion beam assisted deposition cannot handle complex-shaped parts due to the direct radiation limitation of the ion beam technology. The omni-directional ion implantation and deposition (PIIID) technology developed in the late 1980s overcomes the directness lim...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/22C23C14/35C23C14/48C23C14/06
Inventor 王浪平王小峰陆洋
Owner HARBIN INST OF TECH