Solar selective absorption coating and preparation method thereof
An absorbing coating and selective technology, which is used in the production of vacuum devices and the production of high-temperature solar collector tubes, and can solve problems such as difficulty in using high-temperature solar collectors.
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Embodiment 1
[0024] The material of the first metal cathode 5 is titanium, the material of the second metal cathode 6 is aluminum, and the material of the third metal cathode 7 is copper. The coating is divided into an infrared reflection layer 2, an absorption layer 3 and an anti-reflection layer 4 from the base 1 from bottom to top. The infrared reflective layer 2 adopts argon non-reactive sputtering of a copper film with a thickness of 100 nanometers; the end of the absorbing layer 3 close to the infrared reflective layer 2 is a conductive compound layer with a high metal volume ratio, and adopts argon and nitrogen reactive sputtering of the first metal The cathode 5 and the second metal cathode 6 form a TiN-AlN high metal volume ratio absorption layer. By adjusting the current and nitrogen flow, the TiN volume ratio is 0.8 and the thickness is 70 nanometers; the end of the absorption layer 3 away from the infrared reflection layer 2 is lower Insulating medium layer with metal volume ra...
Embodiment 2
[0026] The material of the first metal cathode 5 is zirconium, the material of the second metal cathode 6 is silicon, and the material of the third metal cathode 7 is aluminum. The coating is divided into an infrared reflection layer 2, an absorption layer 3 and an anti-reflection layer 4 from the base 1 from bottom to top. Infrared reflective layer 2 adopts argon gas non-reactive sputtering thickness to be 100 nanometers of aluminum film; Absorption layer 3 adopts argon gas, nitrogen gas reactive sputtering first metal cathode 5 and second metal cathode 6 to form ZrN-SiN absorption layer, then As the sputtering time increases, gradually reduce the zirconium cathode current, increase the aluminum cathode current and the nitrogen flow rate, so that the atomic ratio of ZrN gradually decreases from 100% at the end close to the substrate 1 to 10% at the end far away from the substrate 1, and the thickness is 160 nanometers; The second metal cathode 6 is reactively sputtered with a...
Embodiment 3
[0028] The material of the first metal cathode 5 is palladium, the material of the second metal cathode 6 is silicon, and the material of the third metal cathode 7 is copper. The coating is divided into an infrared reflection layer 2, an absorption layer 3 and an anti-reflection layer 4 from the base 1 from bottom to top. The infrared reflective layer 2 uses argon non-reactive sputtering of a copper film with a thickness of 100 nanometers; the absorption layer 3 uses argon and nitrogen reactive sputtering of the first metal cathode 5 and the second metal cathode 6 to form PdO-SiO 2 Absorbing layer, as the sputtering time increases, gradually reduce the zirconium cathode current, increase the aluminum cathode current and nitrogen flow, so that the atomic ratio of PdO gradually decreases from 100% at the end close to the substrate 1 to 10% at the end far away from the substrate 1, with a thickness of 180 Nano; the anti-reflection layer 4 uses argon, nitrogen reactive sputtering ...
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