Method for preparing diamond/Cu composite material with high heat conductivity
A composite material and diamond technology, applied in metal material coating process, semiconductor/solid-state device components, semiconductor devices, etc., to improve thermal conductivity, increase thermal conductivity, and prevent high-temperature graphitization
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Embodiment 1
[0010] Embodiment 1: adopt the method for magnetron sputtering to plate the Cr-B (mass ratio about 40: 60) composite layer of 4 μ m in thickness on the diamond powder surface, diamond particle size is 50 μ m, Cu powder particle size 50 μ m, the ratio of diamond and Cu powder The volume ratio is 55:45.
[0011] According to the set ratio, the diamond powder and Cu powder of the coated composite layer were mixed in a ball mill for 5 hours. The speed of the ball mill was 120 rpm. For sintering, the sintering temperature is 850°C, the sintering pressure is 40MPa, the heating rate is 35°C / min, and the holding time is 8 minutes. The thermal conductivity of the diamond / Cu composite material prepared by this process reaches 500W / m·K, and the density is higher than 99%.
Embodiment 2
[0012] Embodiment 2: adopt the method for magnetron sputtering to plate the Cr-B (mass ratio about 50: 50) composite layer of 2 μ m in thickness on the diamond powder surface, the diamond particle size is 80 μ m, the Cu powder particle size 80 μ m, the ratio of diamond and Cu powder The volume ratio is 60:40.
[0013] According to the set ratio, mix the coated diamond powder and Cu powder in a ball mill for 4 hours. The speed of the ball mill is 120 rpm. After mixing evenly, put the mixed powder into a graphite mold and put them together in a hot-press furnace Hot press sintering is carried out at a temperature of 900° C., a sintering pressure of 40 MPa, an argon atmosphere, and a holding time of 5 minutes. The thermal conductivity of the diamond / Cu composite material prepared by this process reaches 510W / m·K, and the density is higher than 99%.
Embodiment 3
[0014] Embodiment 3: adopting the method for magnetron sputtering to plate a Cr-B layer with a thickness of 3 μm on the surface of diamond powder, the diamond particle size is 90 μm, and the volume ratio of diamond to Cu powder is 65:35.
[0015] Put the Cr-B-coated diamond powder into the graphite grinding tool, then put the pure Cu ingot on top of the diamond powder, and finally put them together in the infiltration furnace, and raise the temperature to 40°C / min. 1000°C, and then apply a pressure of 1 MPa to infiltrate the molten Cu into the pores between the diamond powders, and the holding time is 6 minutes. The thermal conductivity of the diamond / Cu composite material prepared by this process reaches 505W / m·K, and the density is higher than 99%.
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