Negative resist composition
A technology of negative resist and composition, which is applied in the direction of instruments, optomechanical equipment, coatings, etc., and can solve the problems of reduced transmittance, low thermal stability of photoresist, and contamination of liquid crystal displays, etc.
Active Publication Date: 2009-10-14
SAMSANG CORP
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- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
However, the acryl-based photoresist has low thermal stability during processing at a high temperature of 230° C. or higher, and thus part of the resin is thermally decomposed
As a result, the transmittance in the visible region decreases, and the molecules decomposed during high-temperature processing will contaminate the LCD display
Method used
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Examples
Experimental program
Comparison scheme
Effect test
Embodiment 1
[0040]150 ml of propylene glycol methyl ether acetate (PGMEA) was placed in a mixing chamber with a UV blocking membrane and a stirrer. According to the compositions and contents shown in Table 1 below, a binder resin, a multifunctional (meth)acryl monomer, and a photoinitiator were sequentially added. And 0.1% by weight of FC-430 (manufactured by 3M, a leveling agent) was added. Then, a negative resist composition was prepared and stirred at room temperature. Next, PGMEA was added to control the viscosity of the composition to 18 cps.
Embodiment 2-9
[0042] According to the composition and content in Table 1 below, a negative resist composition was prepared in the same manner as in Example 1.
[0043] Table 1
[0044]
[0045]
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Abstract
The invention relates to a negative resist composition used for liquid crystal display, including adhensive resin comprising specific structure, multifunctional (methyl) acrylate monomer, photoinitiator and organic solvent. The negative resist composition has good UV transmittivity, film residua rate, pattern stability and excellent thermal stability and resistance to water. Therefore, the negative resist composition can be used for forming pattern for organic insulation film, red-green-blue color fliter, black matrix, shock insulator or UV protection layer of liquid crystal display.
Description
technical field [0001] The present invention relates to a kind of negative resist composition (negative resist composition) that is used for display device, particularly, the present invention relates to a kind of negative resist composition with excellent heat resistance and anti-moisture absorption, the The negative resist composition is developed with an alkaline developer, and is used as an R.G.B. color filter (R.G.B. color filter), black matrix (black matrix), spacer (spacer), and UV protective layer of liquid crystal displays, etc. (UV overcoat) or organic insulating film to form a pattern. Background technique [0002] Photoresists are used to form patterns for R.G.B. color filters, black matrices, spacers, UV protection layers, or organic insulating films of liquid crystal displays and the like. The photoresist should have good flatness, transmittance, heat resistance, chemical resistance and moisture absorption resistance. Acryl-based photoresists currently used f...
Claims
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Patent Timeline
Login to View More IPC IPC(8): G03F7/038
CPCG03F7/0007G03F7/0045G03F7/0233G03F7/033G03F7/0382C08F2/50C08F220/18C09D4/06C08F222/102C08F220/325
Inventor 文奉锡金孝精金珍坤梁毕礼全智贤李东焕李休智郑乐七金先镐
Owner SAMSANG CORP