Negative resist composition

A technology of negative resist and composition, which is applied in the direction of instruments, optomechanical equipment, coatings, etc., and can solve the problems of reduced transmittance, low thermal stability of photoresist, and contamination of liquid crystal displays, etc.

Active Publication Date: 2009-10-14
SAMSANG CORP
View PDF0 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the acryl-based photoresist has low thermal stability during processing at a high temperature of 230° C. or higher, and thus part of the resin is thermally de

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Negative resist composition
  • Negative resist composition
  • Negative resist composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040]150 ml of propylene glycol methyl ether acetate (PGMEA) was placed in a mixing chamber with a UV blocking membrane and a stirrer. According to the compositions and contents shown in Table 1 below, a binder resin, a multifunctional (meth)acryl monomer, and a photoinitiator were sequentially added. And 0.1% by weight of FC-430 (manufactured by 3M, a leveling agent) was added. Then, a negative resist composition was prepared and stirred at room temperature. Next, PGMEA was added to control the viscosity of the composition to 18 cps.

Embodiment 2-9

[0042] According to the composition and content in Table 1 below, a negative resist composition was prepared in the same manner as in Example 1.

[0043] Table 1

[0044]

[0045]

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Viscosityaaaaaaaaaa
Login to view more

Abstract

The invention relates to a negative resist composition used for liquid crystal display, including adhensive resin comprising specific structure, multifunctional (methyl) acrylate monomer, photoinitiator and organic solvent. The negative resist composition has good UV transmittivity, film residua rate, pattern stability and excellent thermal stability and resistance to water. Therefore, the negative resist composition can be used for forming pattern for organic insulation film, red-green-blue color fliter, black matrix, shock insulator or UV protection layer of liquid crystal display.

Description

technical field [0001] The present invention relates to a kind of negative resist composition (negative resist composition) that is used for display device, particularly, the present invention relates to a kind of negative resist composition with excellent heat resistance and anti-moisture absorption, the The negative resist composition is developed with an alkaline developer, and is used as an R.G.B. color filter (R.G.B. color filter), black matrix (black matrix), spacer (spacer), and UV protective layer of liquid crystal displays, etc. (UV overcoat) or organic insulating film to form a pattern. Background technique [0002] Photoresists are used to form patterns for R.G.B. color filters, black matrices, spacers, UV protection layers, or organic insulating films of liquid crystal displays and the like. The photoresist should have good flatness, transmittance, heat resistance, chemical resistance and moisture absorption resistance. Acryl-based photoresists currently used f...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G03F7/038
CPCG03F7/0007G03F7/0045G03F7/0233G03F7/033G03F7/0382C08F2/50C08F220/18C09D4/06C08F222/102C08F220/325
Inventor 文奉锡金孝精金珍坤梁毕礼全智贤李东焕李休智郑乐七金先镐
Owner SAMSANG CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap