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Device or method for preparing solution for processing single-chip semiconductor

A technology for semiconductors and workpieces, applied in the field of solution preparation equipment for processing single-piece semiconductor workpieces, can solve problems such as increasing system costs and failing to reach process temperature.

Active Publication Date: 2009-11-18
ACM RES SHANGHAI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Because this method is similar to an instantaneous mixing and conveying technology, the desired process temperature may not be reached at the conveying point, unless multiple sets of heating devices built into the pipeline are added at the front of the conveying point, but this will further increase the cost of the system

Method used

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  • Device or method for preparing solution for processing single-chip semiconductor
  • Device or method for preparing solution for processing single-chip semiconductor
  • Device or method for preparing solution for processing single-chip semiconductor

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Embodiment Construction

[0018] Such as figure 1 As shown, in one embodiment of the present invention, the equipment has a large amount of chemical solution preheating device 101 to preheat the chemical solution to a predetermined temperature T0. The preheating device 101 can be a circulating heating tank or a pipeline built-in heater, Or other liquid heating mechanism. The material of the heating device is PVDF, PTFE, PFA or quartz. When chemical solution is needed, a large amount of chemical solution is delivered to the preheating device by the facility controlled by the software control system, and the preheating device 101 is connected to the pump 102 and the fluid control device 103 by the chemical solution delivery pipeline. The chemical solution delivery pipeline is connected with at least one chemical solution input pipe 105, and the pressure of the solution input pipe 105 is controlled by the control device. The chemical solution input pipe 105 is connected with the mixing container, and is...

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PUM

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Abstract

The invention discloses a device for preparing chemical solution with low cost, which can control process parameters, such as chemical freshness, temperature, active ingredient yield , and the like of a use point; in addition, the device enables the parameters to keep in chamber-chamber conformity among a plurality of process cavities of a single-chip wet-method cleaning system. The invention also discloses a method which is used for controlling the detention time of the chemical solution mixture to obtain the optimal effect of the joint action of the temperature, the active ingredient reactivity and the yield of the chemical solution mixture, thereby achieving the optimal chip cleaning effect.

Description

technical field [0001] The present invention relates to the processing of semiconductor workpieces, and more particularly, to solution preparation apparatus and methods for processing monolithic semiconductor workpieces. Background technique [0002] Semiconductor components are fabricated and produced on semiconductor wafers using a number of different processing steps to create transistors and interconnecting elements. In the process of forming the interconnection elements, the semiconductor wafer may undergo processes such as masking, etching and deposition to form the semiconductor transistors and the required electronic circuits to connect the terminals of these transistors. Specifically, multiple masking, ion implantation, annealing and plasma etching, and chemical and physical vapor deposition steps may be performed to form narrow trenches, transistor wells, gates, polysilicon lines, and interconnection structures. At each step, particles and contaminants can be adde...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/00H01L21/306B08B3/00B05B9/04B05B12/00
Inventor 马悦何川施广涛N.纳其王晖
Owner ACM RES SHANGHAI