Insulating coating, methods of manufacture thereof and articles comprising the same
A technology for products, insulating layers, applied in the direction of final product manufacturing, sustainable manufacturing/processing, coating, etc., can solve problems such as inability to withstand high temperatures
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Embodiment 1
[0050] This example was performed to illustrate the stability of insulating layers on metal substrates. The metal substrate includes a metal housing fabricated from stainless steel. A silicon-containing film with a thickness of 5 microns or 10 microns is deposited on the metal housing by using an expanding thermal plasma. Octamethylcyclotetrasiloxane (D 4 ) are used as precursors for paints.
[0051] Metal housings were cleaned with isopropanol, rinsed, and air dried prior to deposition. The substrates were loaded onto racks in a load lock, pumped down to approximately 26 mTorr, preheated at 1000 Watts for 10 seconds, and then introduced into the expanding thermal plasma. The expanded thermal plasma uses an atmosphere comprising argon and oxygen in a volume ratio of 1:3. Argon gas is used to form the plasma. Octamethylcyclotetrasiloxane dissociates at the high temperature of the expanding hot plasma and combines with oxygen in the plasma to form a silicon-containing insulat...
Embodiment 2
[0053] The metal substrate in this example is stainless steel foil. The stainless steel foil was treated similarly to the metal casing of Example 1 prior to the deposition of the coating in the expanding thermal plasma. The method of depositing the insulating layer in this embodiment is similar to that in Embodiment 1. The composition of the insulating layer in this example is similar to that in Example 1. The stainless steel foil with the insulating layer arranged on the surface was heat-treated at a temperature of 500° C. for 30 minutes. After heat treatment, no delamination or cracking was observed in the insulating layer.
Embodiment 3
[0054] This example was carried out to determine the quality of a multilayer device in which one of the layers is an insulating layer disposed in an expanding thermal plasma as described above. The metal substrate is a stainless steel foil similar to that in Example 2. An insulating layer was disposed on a stainless steel foil in a similar manner to that in Example 2. The thickness of the insulating layer is similar to that described in Example 2. 500 nm of molybdenum was deposited on the insulating coating by sputtering.
[0055] The system used for sputtering was a Perkin Elmer model 2400 Radio Frequency sputter coater. The type of sputtering was radio frequency (RF) planar deposition using a 6 inch circular molybdenum target (99.95% pure). Prior to deposition, samples were degreased using Genesolve solvents, then ultrasonically cleaned in acetone, followed by methanol. The vacuum in the sputter coater before deposition is 4 x 10 -7 torr. The target to substrate distan...
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Abstract
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