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Photomask blank and photomask

A technology of photomasks and light-shielding materials, which is applied in the direction of photosensitive materials used in photomechanical equipment, optics, and photographic plate-making processes on patterned surfaces. It can solve problems such as inability to exert sensitivity and achieve excellent linearity

Inactive Publication Date: 2010-03-03
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when the photopolymerizable composition disclosed in these documents is applied to an application that requires a high concentration of a light-shielding material, such as a photosensitive layer in a photomask, it cannot exhibit sufficient sensitivity.

Method used

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  • Photomask blank and photomask
  • Photomask blank and photomask
  • Photomask blank and photomask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～15、 comparative example 1～5

[0328] 1. Production of photomask

[0329] (Formation of photosensitive layer)

[0330] On a glass substrate (10cm×10cm), the dry coating mass is 1.4g / m 2 The high-sensitivity photopolymerizable composition P-1 of the following composition was applied by the method, and it was made to dry at 100 degreeC for 1 minute, and the photosensitive layer was formed.

[0331]

[0332] · Carbon black dispersion 16.0 parts by mass

[0333] (CDP-K8, manufactured by Toyo Kasei Co., Ltd., 50% by mass propylene glycol monomethyl ether acetate solution)

[0334] ・Ethylenically unsaturated compound (A-1) (compound of the following structure) 4.2 parts by mass

[0335] ・Linear organic polymer (B-1) (polymer binder with the following structure, weight average molecular weight: 50,000) 3.6 parts by mass

[0336] ・Sensitizing dye (C-1) (compound of the following structure) 0.21 parts by mass

[0337] ・Photopolymerization initiator (D-1) (compound of the following structure) 0.81 parts by mas...

Embodiment 16～30、 comparative example 6～10

[0364] In Examples 1 to 15 and Comparative Examples 1 to 5, the high-sensitivity photopolymerizable composition P-1 for forming the photosensitive layer was changed to the high-sensitivity photopolymerizable composition P-2 of the following composition, except Except, operate in the same manner as Examples 1-15 and Comparative Examples 1-5, obtain the photomask plates (6)-(30) of Examples 16-30 and the photomask plates (C6) of Comparative Examples 6-10 )~(C10).

[0365]

[0366] 16 parts by mass of carbon black dispersion

[0367] (CDP-K8, manufactured by Toyo Kasei Co., Ltd., 50% propylene glycol monomethyl acetate solution)

[0368] ・Ethylenically unsaturated compound (A-1) (compound of the above structure) 4.2 parts by mass

[0369] ・Linear organic polymer (B-1) (polymer binder with the above structure, weight average molecular weight: 50,000) 3.6 parts by mass

[0370] ・Sensitizing pigment (C-1) (compound of the above structure) 0.21 parts by mass

[0371] ・Photopoly...

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Abstract

The present invention provides a photomask blank and a photomask made from the same, the photomask blank is characterized in that a transparent substrate is in turn provided with a sensitive layer containing shading material, sensitized dye, photopolymerization initiator, ethylene unsaturated compound and polymer adhesive and an oxygen barrier layer of which the oxygen permeability is more than 50ml / m<2>.day.atm and less than 500ml / m<2>.day.atm at 25DEG C.

Description

technical field [0001] The invention relates to a photomask blanks and a photomask. More specifically, it relates to a photomask that can be used in photolithography processes in the fields of flat panel displays such as PDP, FED, and LCD, shadow masks for CRT, printed wiring boards, and semiconductors, A photomask obtained by using this. Background technique [0002] As photomasks used in photolithography processes in the fields of flat panel displays, CRT shadow masks, printed circuit boards, semiconductors, etc., there are known Cr masks provided with a metal chromium layer (Cr layer), and a Cr mask provided with a silver halide layer. Em mask (emulsion mask) of the emulsion layer (see, for example, "Edited by the Society of Educational Arts and Sciences, "Photoprocessing" ("Photofabrique-Sion"), published by the Japan Photoprocessing Association, pp. 67-80, June 1992"). [0003] The Cr mask is produced as follows: After forming a chromium layer by sputtering on a trans...

Claims

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Application Information

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IPC IPC(8): G03F7/11G03F1/00G03F1/50G03F1/56
Inventor 长濑博幸
Owner FUJIFILM CORP
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