Frame of large pellicle and grasping method of frame

A frame and film technology, which is applied to the frame of large-scale film components and the control field of the frame

Active Publication Date: 2010-03-31
ASAHI KASEI KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it is generally considered that with this method, in the case of a large surface film member, since the label (pressing portion) arranged in the center of the side is held in the container with an adhesive tape, even if it is peeled off while detecting the load Unavoidable deflection of the frame (see FIG. 9 of Patent Document 13)

Method used

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  • Frame of large pellicle and grasping method of frame
  • Frame of large pellicle and grasping method of frame
  • Frame of large pellicle and grasping method of frame

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0251] A quadrangular aluminum alloy frame body having a long side length of 1600 mm, a short side length of 1400 mm, a width of 14 mm, and a height of 6 mm was prepared. At the position where the height of the outer surface of each side is 3mm, centering on 3 points 250mm from the center of each side and the two ends of each side, 3 points are formed on each side of all 4 sides of the frame by cutting. A groove in which the circumferential length of the opening is 200 mm, the height of the opening is 1.5 mm, and the depth of the groove is 3 mm.

[0252] On the lower edge surface of the frame, a polyethylene foam substrate (thickness: 1 mm) coated with an acrylic adhesive was attached as an adhesive material layer. Next, the same frame-shaped protective film as the above-mentioned frame body, that is, a protective film made of polyethylene terephthalate resin coated with a silicon-based mold release agent on the surface, is laminated on the adhesive material layer. The protec...

Embodiment 2

[0255] Except that the length of the long side was 1800 mm, the length of the short side was 1600 mm, and the width was 16 mm, a frame body similar to that of the above-mentioned Example 1 was prepared, and it was fixed to the pallet in the same manner as in Example 1.

Embodiment 3

[0257] Except that the length of the long side was 2000 mm, the length of the short side was 1800 mm, and the width was 18 mm, a frame body similar to that of the above-mentioned Example 1 was prepared, and it was fixed to the pallet in the same manner as in Example 1.

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Abstract

A frame of large pellicle comprising a polygonal frame having a plurality of sides, a pellicle film bonded to the upper edge surface of the frame, and an adhesive material applied on the lower edge surface of the frame wherein upon grasping the frame of a large-sized pellicle the longest side of which frame is 1m or longer, the frame has protrusions or recesses for grasping on all sides of the frame. The frame is grasped surely by grasping the protrusions or recesses for grasping at at least one position or more on each side of the frame simultaneously, and the pellicle can be taken out easilyfrom a container without causing distortion or flexure when it is stuck on a photomask, or the like.

Description

technical field [0001] The present invention relates to a frame body as a constituent member of a pellicle for preventing damage to a thin film transistor (TFT) constituting a liquid crystal display (LCD), a color filter (CF), etc. Foreign matter adheres to a photomask or a reticle used in a photolithography process. In particular, it relates to a frame as a constituent member of a large-scale film member for liquid crystals, that is, a constituent member of a large-scale film member whose long side length is 1 m or more. Background technique [0002] The present invention relates to a technique related to a frame as a constituent member of a surface film member, and first, the surface film member will be described. [0003] Conventionally, in the manufacture of semiconductor devices, a dust-proof member called a pellicle is generally used to prevent foreign matter from adhering to a photomask or a reticle in a photolithography process for forming a circuit pattern on a waf...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/14G03F1/64
CPCG03F1/64G03F7/70983G03F7/70783G03F7/70791
Inventor 谷村彰浩前田拓郎
Owner ASAHI KASEI KK
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