Method for preparing conductive composite atomic oxygen protective coating ITO/MgF2
A composite atom and protective coating technology, applied in the aerospace field, can solve the problems of easy occurrence of micro-cracks, easy accumulation of static electricity, atomic oxygen erosion, etc., and achieves the effects of good protection performance, good flexibility, and improved work efficiency.
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Embodiment 1
[0021] (1) Preparation diameter is 100mm, thickness is 10mm, In 2 O 3 The mole percentage of 91%, SnO 2 An ITO target with a molar percentage of 9%;
[0022] (2) Prepare 4 pieces of MgF with a diameter of 100mm and a fan angle of 20° 2 Sheet material, MgF 2 The purity of 99.9%;
[0023] (3) MgF 2 The sheet material is evenly pasted on the ITO target;
[0024] (4) The ITO / MgF prepared in (3) 2 The composite target is installed on the target base of the magnetron sputtering equipment, and the magnetron sputtering equipment is evacuated to 2×10 -3 Pa, then add Ar gas, turn on the power of the magnetron sputtering target, the target surface will produce glow discharge, and the Ar ion current will affect the ITO / MgF 2 The target is bombarded, and ITO and MgF are sputtered from the target surface 2 , Deposited on Kapton substrate to get ITO / MgF 2 Conductive composite atomic oxygen protective coating; deposition discharge power is 100W, discharge pressure is 5×10 -1 Pa, the deposition time i...
Embodiment 2
[0028] (1) Preparation diameter is 100mm, thickness is 10mm, In 2 O 3 The mole percentage of 91%, SnO 2 An ITO target with a molar percentage of 9%;
[0029] (2) Prepare 6 pieces of MgF with a diameter of 100mm and a sector angle of 15° 2 Sheet material, MgF 2 The purity of 99.9%;
[0030] (3) MgF 2 The sheet material is evenly pasted on the ITO target;
[0031] (4) The ITO / MgF prepared in (3) 2 The composite target is installed on the target base of the magnetron sputtering equipment, and the magnetron sputtering equipment is evacuated to 2×10 -3 Pa, then add Ar gas, turn on the power of the magnetron sputtering target, the target surface will produce glow discharge, and the Ar ion current will affect the ITO / MgF 2 The target is bombarded, and ITO and MgF are sputtered from the target surface 2 , Deposited on Kapton substrate to get ITO / MgF 2 Conductive composite atomic oxygen protective coating; deposition discharge power is 120W, discharge pressure is 4×10 -1 Pa, deposition time is...
Embodiment 3
[0035] (1) Preparation diameter is 100mm, thickness is 10mm, In 2 O 3 The mole percentage of 91%, SnO 2 An ITO target with a molar percentage of 9%;
[0036] (2) Prepare 5 pieces of MgF with a diameter of 100mm and a fan angle of 20° 2 Sheet material, MgF 2 The purity of 99.9%;
[0037] (3) MgF 2 The sheet material is evenly pasted on the ITO target;
[0038] (4) The ITO / MgF prepared in (3) 2 The composite target is installed on the target base of the magnetron sputtering equipment, and the magnetron sputtering equipment is evacuated to 2×10 -3 Pa, then add Ar gas, turn on the power of the magnetron sputtering target, the target surface will produce glow discharge, and the Ar ion current will affect the ITO / MgF 2 The target is bombarded, and ITO and MgF are sputtered from the target surface 2 , Deposited on Kapton substrate to get ITO / MgF 2 Conductive composite atomic oxygen protective coating; deposition discharge power is 110W, discharge pressure is 4.5×10 -1 Pa, the deposition time...
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