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Method for preparing conductive composite atomic oxygen protective coating ITO/MgF2

A composite atom and protective coating technology, applied in the aerospace field, can solve the problems of easy occurrence of micro-cracks, easy accumulation of static electricity, atomic oxygen erosion, etc., and achieves the effects of good protection performance, good flexibility, and improved work efficiency.

Active Publication Date: 2010-06-09
NO 510 INST THE FIFTH RES INST OFCHINA AEROSPAE SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to solve the problem that the existing atomic oxygen protective coating is easy to accumulate static electricity, brittle, prone to microcracks, and thus easily corroded by atomic oxygen, and proposes a conductive composite atomic oxygen protective coating ITO / MgF 2 The preparation method, the prepared ITO / MgF 2 MgF in Conductive Composite Atom Oxygen Protective Coating 2 The mass fraction is 7% to 9%, and the surface resistivity is less than or equal to 10 9 Ω / m 2

Method used

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  • Method for preparing conductive composite atomic oxygen protective coating ITO/MgF2
  • Method for preparing conductive composite atomic oxygen protective coating ITO/MgF2

Examples

Experimental program
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Effect test

Embodiment 1

[0021] (1) Preparation diameter is 100mm, thickness is 10mm, In 2 O 3 The mole percentage of 91%, SnO 2 An ITO target with a molar percentage of 9%;

[0022] (2) Prepare 4 pieces of MgF with a diameter of 100mm and a fan angle of 20° 2 Sheet material, MgF 2 The purity of 99.9%;

[0023] (3) MgF 2 The sheet material is evenly pasted on the ITO target;

[0024] (4) The ITO / MgF prepared in (3) 2 The composite target is installed on the target base of the magnetron sputtering equipment, and the magnetron sputtering equipment is evacuated to 2×10 -3 Pa, then add Ar gas, turn on the power of the magnetron sputtering target, the target surface will produce glow discharge, and the Ar ion current will affect the ITO / MgF 2 The target is bombarded, and ITO and MgF are sputtered from the target surface 2 , Deposited on Kapton substrate to get ITO / MgF 2 Conductive composite atomic oxygen protective coating; deposition discharge power is 100W, discharge pressure is 5×10 -1 Pa, the deposition time i...

Embodiment 2

[0028] (1) Preparation diameter is 100mm, thickness is 10mm, In 2 O 3 The mole percentage of 91%, SnO 2 An ITO target with a molar percentage of 9%;

[0029] (2) Prepare 6 pieces of MgF with a diameter of 100mm and a sector angle of 15° 2 Sheet material, MgF 2 The purity of 99.9%;

[0030] (3) MgF 2 The sheet material is evenly pasted on the ITO target;

[0031] (4) The ITO / MgF prepared in (3) 2 The composite target is installed on the target base of the magnetron sputtering equipment, and the magnetron sputtering equipment is evacuated to 2×10 -3 Pa, then add Ar gas, turn on the power of the magnetron sputtering target, the target surface will produce glow discharge, and the Ar ion current will affect the ITO / MgF 2 The target is bombarded, and ITO and MgF are sputtered from the target surface 2 , Deposited on Kapton substrate to get ITO / MgF 2 Conductive composite atomic oxygen protective coating; deposition discharge power is 120W, discharge pressure is 4×10 -1 Pa, deposition time is...

Embodiment 3

[0035] (1) Preparation diameter is 100mm, thickness is 10mm, In 2 O 3 The mole percentage of 91%, SnO 2 An ITO target with a molar percentage of 9%;

[0036] (2) Prepare 5 pieces of MgF with a diameter of 100mm and a fan angle of 20° 2 Sheet material, MgF 2 The purity of 99.9%;

[0037] (3) MgF 2 The sheet material is evenly pasted on the ITO target;

[0038] (4) The ITO / MgF prepared in (3) 2 The composite target is installed on the target base of the magnetron sputtering equipment, and the magnetron sputtering equipment is evacuated to 2×10 -3 Pa, then add Ar gas, turn on the power of the magnetron sputtering target, the target surface will produce glow discharge, and the Ar ion current will affect the ITO / MgF 2 The target is bombarded, and ITO and MgF are sputtered from the target surface 2 , Deposited on Kapton substrate to get ITO / MgF 2 Conductive composite atomic oxygen protective coating; deposition discharge power is 110W, discharge pressure is 4.5×10 -1 Pa, the deposition time...

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Abstract

The invention relates to a method for preparing a conductive composite atomic oxygen protective coating ITO / MgF2, in particular to a magnetron sputtering method for preparing the ITO / MgF2 conductive composite coating by using a composite target to realize the atomic oxygen protection of base materials, and belongs to the technical field of aerospace. The method comprises the following steps of: uniformly adhering MgF2 flaky materials on an ITO target by using conductive adhesive; and then arranging the ITO / MgF2 composite target on a target holder of magnetron sputtering equipment to obtain the ITO / MgF2 conductive composite atomic oxygen protective coating. The ITO / MgF2 conductive composite atomic oxygen protective coating has the advantages that: the coating has good protective property and electric conductivity and does not accumulate static electricity in a space plasma environment; the ITO / MgF2 composite coating has good flexibility and obvious advantage when applied to the surfaces needing to be wound, such as the surface of a flexible thin film; and the ITO / MgF2 composite coating has an anti-reflection effect on ray and can improve the working efficiency when applied to optical devices.

Description

Technical field [0001] The invention relates to a conductive composite atomic oxygen protective coating ITO / MgF 2 Preparation method, especially the use of magnetron sputtering method to prepare ITO / MgF with composite target 2 Conductive composite coating to realize the atomic oxygen protection of the base material belongs to the field of aerospace technology. Background technique [0002] The spacecraft runs in a space plasma environment, and the atomic oxygen in between has high energy and flux, and its chemical properties are very active. Atomic oxygen has a strong oxidative and corrosive effect on the surface materials of spacecraft, which will cause structural materials to be thinned, deformed, and reduced in strength, change the optical performance of optical devices, and change the optical performance of thermal control coatings, resulting in thermal control failure . These effects significantly affect the performance and service life of the spacecraft. [0003] At the sam...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/06
Inventor 李中华郑阔海赵琳
Owner NO 510 INST THE FIFTH RES INST OFCHINA AEROSPAE SCI & TECH
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