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Vacuum treatment unit and vacuum treatment process

A vacuum processing and equipment technology, applied in the field of vacuum processing equipment, can solve the problems of unstable operation process, inability to effectively decompose gaseous precursors, and low plasma density

Active Publication Date: 2013-10-16
OERLIKON SURFACE SOLUTIONS AG PFAFFIKON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Additionally, dependencies on charge and substrate shape make process predictability difficult, implying high additional costs in process development
[0008] Another disadvantage of diode glow discharges is their low plasma density and, as a result, the inability to efficiently, i.e. as completely decompose, the gaseous precursors
However, it has also been shown that usually cooled low-voltage arc discharge metal anodes are coated with an insulating film in a short period of time, which mainly leads to instability in the working process when the coating time is long

Method used

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  • Vacuum treatment unit and vacuum treatment process
  • Vacuum treatment unit and vacuum treatment process
  • Vacuum treatment unit and vacuum treatment process

Examples

Experimental program
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Effect test

example 1

[0075] Example 1. Process for manufacturing a DLC including an interlayer composed of Si / SiC.

[0076] After placing the workpiece in the double or triple rotatable support provided for this purpose and sending the support into the vacuum processing equipment, the processing chamber is evacuated to about 10 -4 mbar pressure.

[0077] In order to adjust the processing temperature, between a cathode chamber separated by an orifice plate, including a hot cathode constituting the NVB cathode, and the workpiece connected to the anode side, a low-voltage arc (NVB) plasma is formed and heated in an argon hydride atmosphere. was ignited. The substrate voltage applied to the workpiece is then preferably also unipolarly or bipolarly pulsed. In this example, no standard radiant heaters were used.

[0078] The heating process is based on the following parameters:

[0079] NVB discharge current: 50A

[0080] Argon flow: 60sccm

[0081] Hydrogen flow: 300sccm

[0082] Processing time...

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Abstract

Vacuum treatment installation or vacuum treatment method for carrying out a plasma method, wherein the treatment is carried out in a vacuum chamber, in which are disposed a device for generating an electric low voltage arc discharge (NVBE) comprised of a cathode and an anode electrically interconnectable with the cathode via an arc generator, and a workpiece carrier electrically interconnectable with a bias generator for receiving and moving workpieces, as well as at least one feed for inert and / or reactive gas. At least a portion of the surface of the anode is therein fabricated of graphite and is operated at high temperature.

Description

technical field [0001] The present invention relates to a vacuum treatment device and a vacuum treatment method for plasma treatment of workpieces. Background technique [0002] Under vacuum processing methods, plasma-assisted methods currently occupy a considerable place for coating, heating and etching various workpieces such as tools or components in the field of plant and engine construction. In this case, the vacuum coating process is usually preceded by heating and / or etching operations, which are used for special purposes such as pre-cleaning, surface activation or layer removal, but can also be used alone. [0003] Despite the widespread availability of the above-mentioned methods, it is currently difficult or labor-intensive to carry out such a method if the insulating underlayer and / or the weakly conductive layer or the insulating film is to be deposited on the electrode faces in one method step. This film can be formed, for example, by surface effects or re-sputt...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/06C23C14/22C23C14/02C23C30/00C23C28/00C23C16/26
CPCC23C14/325C23C8/36C23C16/0245C23C16/503H01J37/32055H01J37/3255C23C14/32C23C14/243C23C14/02C23C14/12C23C14/14
Inventor J·拉姆B·威德里格S·卡塞曼M·D·皮门塔O·马斯勒B·汉塞尔曼
Owner OERLIKON SURFACE SOLUTIONS AG PFAFFIKON