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High-brightness AlGaInP-based light-emitting diode with introduced roughened layer and manufacturing method thereof

An aluminum gallium indium phosphorous-based light-emitting diode technology, which is applied to high-brightness aluminum-gallium-steel phosphorous-based light-emitting diodes and the production field thereof, can solve the problems of complex production process, surface damage affecting electrical performance, and bonding wire pits in the light-emitting epitaxial layer, etc. problem, to achieve the effect of improving light extraction efficiency

Active Publication Date: 2013-01-23
QUANZHOU SANAN SEMICON TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For conventional AlGaInP-based light-emitting diodes, the surface is a p-type GaP bonding window layer. The chemical properties of GaP are relatively stable, and general chemical wet methods cannot be etched and roughened, while dry etching will cause Surface damage affects electrical properties, so the surface roughening process is difficult to apply to conventional AlGaInP-based light-emitting diodes
Compared with gallium phosphide, AlGaInP-based epitaxial materials are easier to be chemically wet etched, and more particularly, the n-type AlGaInP on the side of the growth substrate can be etched by a certain amount of wet etching. The excellent roughened morphology can greatly improve the light extraction efficiency, but it can only be applied to the junction of flip-chip AlGaInP-based light-emitting diodes based on substrate transfer. However, the manufacturing process of flip-chip AlGaInP-based light-emitting diodes Complex, and there are hidden dangers such as bonding wire pits and other hidden dangers after the light-emitting epitaxial layer is transferred through bonding

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  • High-brightness AlGaInP-based light-emitting diode with introduced roughened layer and manufacturing method thereof
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  • High-brightness AlGaInP-based light-emitting diode with introduced roughened layer and manufacturing method thereof

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Embodiment Construction

[0044] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0045] like figure 1 A schematic cross-sectional view of a high-brightness AlGaInP-based light-emitting diode structure with a roughened layer is shown, the structure includes: a gallium arsenide substrate 100, which has two main surfaces; a buffer layer 101 formed on arsenic On a main surface of GaN substrate 100; distributed Bragg reflector DBR 102 is formed on buffer layer 101; n-AlInP layer 103 is formed on DBR 102; multiple quantum well active layer 104 is formed on n- On the AlInP layer 103; the p-AlInP layer 105 is formed on the multi-quantum well active layer 104; the first p-GaP layer 106 is formed on the p-AlInP layer 105; the second p-GaP layer 203 is formed on the second On a p-GaP layer 106; the rough n-AlInP layer 202A is formed on a partial region of the second p-GaP layer 203; the p-electrode 110 is formed on another partial region of t...

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Abstract

The invention provides a high-brightness AlGaInP-based light-emitting diode with an introduced armoring layer and a manufacturing method thereof. On the basis of the conventional AlGaInP-based light-emitting diode, a roughened n-type AlGaInP-based epitaxial layer is introduced and combined into the structure of the conventional light-emitting diode through bonding and substrate removal; a first epitaxial wafer is the conventional AlGaInP-based light-emitting diode; a second epitaxial wafer is manufactured to provide a roughened epitaxial layer; in order to combine the roughened epitaxial layer onto the surface of a first bonding window layer of the first epitaxial wafer, a second bonding window layer is arranged between the roughened epitaxial layer and the first bonding window layer; andthe first bonding window layer and the second bonding window layer are combined to form bonding in a direct bonding mode under the conditions of high temperature and high pressure. In the method, then-type AlGaInP-based epitaxial layer roughened by a wet method is successfully applied to the conventional AlGaInP-based light-emitting diode, and light extraction efficiency is greatly improved; andcompared with the manufacturing process for an inverted AlGaInP-based light-emitting diode, the manufacturing process of the invention is simple and avoids the problem of bonding wire pits.

Description

technical field [0001] The invention relates to an aluminum gallium indium phosphorus-based light-emitting diode and a manufacturing method thereof, in particular to a high-brightness aluminum-gallium-steel-phosphorus-based light-emitting diode with an introduced roughening layer that can improve light extraction efficiency and a manufacturing method thereof. Background technique [0002] With the promotion of market demand and technological progress, red and yellow aluminum gallium indium phosphorus-based light-emitting diodes have been widely used in different fields such as display screens, indicator lights, digital products, and backlight sources. Due to the limitations of the material itself, the traditional AlGaInP-based light-emitting diodes have a bottleneck in the improvement of luminous efficiency, and have gradually been unable to meet the requirements of high-end applications. Therefore, it is urgent to greatly improve the luminous efficiency at the current techni...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L33/20H01L33/22
Inventor 潘群峰吴志强洪灵愿吴超瑜
Owner QUANZHOU SANAN SEMICON TECH CO LTD