High-brightness AlGaInP-based light-emitting diode with introduced roughened layer and manufacturing method thereof
An aluminum gallium indium phosphorous-based light-emitting diode technology, which is applied to high-brightness aluminum-gallium-steel phosphorous-based light-emitting diodes and the production field thereof, can solve the problems of complex production process, surface damage affecting electrical performance, and bonding wire pits in the light-emitting epitaxial layer, etc. problem, to achieve the effect of improving light extraction efficiency
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[0044] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0045] like figure 1 A schematic cross-sectional view of a high-brightness AlGaInP-based light-emitting diode structure with a roughened layer is shown, the structure includes: a gallium arsenide substrate 100, which has two main surfaces; a buffer layer 101 formed on arsenic On a main surface of GaN substrate 100; distributed Bragg reflector DBR 102 is formed on buffer layer 101; n-AlInP layer 103 is formed on DBR 102; multiple quantum well active layer 104 is formed on n- On the AlInP layer 103; the p-AlInP layer 105 is formed on the multi-quantum well active layer 104; the first p-GaP layer 106 is formed on the p-AlInP layer 105; the second p-GaP layer 203 is formed on the second On a p-GaP layer 106; the rough n-AlInP layer 202A is formed on a partial region of the second p-GaP layer 203; the p-electrode 110 is formed on another partial region of t...
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