Gallium nitride based avalanche detector and preparation method thereof
A gallium nitride-based, manufacturing method technology, applied in semiconductor devices, final product manufacturing, sustainable manufacturing/processing, etc., can solve the problems affecting the development and application of gallium nitride UV detectors, the mutual restriction of detection sensitivity and dark current, etc. question
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[0042] Please refer to Fig. 1 and Fig. 2, a gallium nitride-based avalanche detector with a positively irradiated absorbing layer and a multiplication layer separated by the present invention includes:
[0043] A substrate 10, the substrate 10 is sapphire, gallium nitride, silicon, silicon carbide or gallium arsenide material which is conducive to the epitaxial growth of group III nitrides;
[0044] An N-type doped GaN ohmic contact layer 11, the N-type doped GaN ohmic contact layer 11 is fabricated on the substrate 10;
[0045] An unintentionally doped GaN absorbing layer 12, the unintentionally doped GaN absorbing layer 12 is made on the N-type doped GaN ohmic contact layer 11, and the area of the unintentionally doped GaN absorbing layer 12 is smaller than that of the N-type doped The area of the GaN ohmic contact layer 11. This layer acts as an absorbing layer for light in the detector response band (photon energy is between the band gaps of GaN and AlGaN);
[0046] ...
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